TY - JOUR
T1 - Etching a single micrometer-size particle in a plasma
AU - Stoffels, W.W.
AU - Stoffels - Adamowicz, E.
AU - Swinkels, G.H.P.M.
AU - Boufnichel, M.
AU - Kroesen, G.M.W.
PY - 1999
Y1 - 1999
N2 - Treatment of a single micrometer-size dust particle in a low-pressure radio-frequency discharge is presented.
The particle is trapped in a potential well and its radius is accurately determined using angle-resolved Mie scattering. In an oxygen plasma, the particle radius can be decreased in a well-controlled way.
AB - Treatment of a single micrometer-size dust particle in a low-pressure radio-frequency discharge is presented.
The particle is trapped in a potential well and its radius is accurately determined using angle-resolved Mie scattering. In an oxygen plasma, the particle radius can be decreased in a well-controlled way.
U2 - 10.1103/PhysRevE.59.2302
DO - 10.1103/PhysRevE.59.2302
M3 - Article
SN - 1063-651X
VL - 59
SP - 2302
EP - 2304
JO - Physical Review E: Statistical, Physics, Plasmas, Fluids, and Related Interdisciplinary Topics
JF - Physical Review E: Statistical, Physics, Plasmas, Fluids, and Related Interdisciplinary Topics
IS - 2
ER -