Etching a single micrometer-size particle in a plasma

W.W. Stoffels, E. Stoffels - Adamowicz, G.H.P.M. Swinkels, M. Boufnichel, G.M.W. Kroesen

Research output: Contribution to journalArticleAcademicpeer-review

47 Citations (Scopus)

Abstract

Treatment of a single micrometer-size dust particle in a low-pressure radio-frequency discharge is presented. The particle is trapped in a potential well and its radius is accurately determined using angle-resolved Mie scattering. In an oxygen plasma, the particle radius can be decreased in a well-controlled way.
Original languageEnglish
Pages (from-to)2302-2304
JournalPhysical Review E: Statistical, Physics, Plasmas, Fluids, and Related Interdisciplinary Topics
Volume59
Issue number2
DOIs
Publication statusPublished - 1999

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