Etch Engineered InP Processing for a Fabrication Tolerant Slanted Waveguide

Kolsoom Mehrabi; Floris Pronk; Jeroen Bolk; Jos J.G.M. van der Tol; Weiming Yao

doi:10.1109/IPC65510.2025.11281991

Etch Engineered InP Processing for a Fabrication Tolerant Slanted Waveguide

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

We present a process for fabrication-tolerant slanted waveguides used in photonic integrated devices requiring asymmetry. An etch-stop waveguide is positioned parallel to the main waveguide, enabling the self-limiting feature of bromine–
methanol etching. A V-groove forms, allowing controlled etch termination. Demonstration is on InP waveguides.

Original language	English
Title of host publication	IEEE Photonics Conference, IPC
Publisher	Institute of Electrical and Electronics Engineers
Number of pages	2
ISBN (Electronic)	979-8-3315-2559-0
DOIs	https://doi.org/10.1109/IPC65510.2025.11281991
Publication status	Published - 22 Dec 2025
Event	2025 IEEE Photonics Conference - Singapore, Singapore, Singapore Duration: 9 Nov 2025 → 13 Nov 2025 https://ieeephotonics.org/event/ieee-photonics-conference-ipc-2025/

Conference

Conference	2025 IEEE Photonics Conference
Abbreviated title	IPC
Country/Territory	Singapore
City	Singapore
Period	9/11/25 → 13/11/25
Internet address	https://ieeephotonics.org/event/ieee-photonics-conference-ipc-2025/

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10.1109/IPC65510.2025.11281991

pdfFinal published version, 1.12 MBLicence: TAVERNE

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@inproceedings{2511b26c087444ba8e43b7dca9143435,

title = "Etch Engineered InP Processing for a Fabrication Tolerant Slanted Waveguide",

abstract = "We present a process for fabrication-tolerant slanted waveguides used in photonic integrated devices requiring asymmetry. An etch-stop waveguide is positioned parallel to the main waveguide, enabling the self-limiting feature of bromine{\textendash} methanol etching. A V-groove forms, allowing controlled etch termination. Demonstration is on InP waveguides.",

author = "Kolsoom Mehrabi and Floris Pronk and Jeroen Bolk and \{van der Tol\}, \{Jos J.G.M.\} and Weiming Yao",

year = "2025",

month = dec,

day = "22",

doi = "10.1109/IPC65510.2025.11281991",

language = "English",

booktitle = "IEEE Photonics Conference, IPC",

publisher = "Institute of Electrical and Electronics Engineers",

address = "United States",

note = "2025 IEEE Photonics Conference, IPC ; Conference date: 09-11-2025 Through 13-11-2025",

url = "https://ieeephotonics.org/event/ieee-photonics-conference-ipc-2025/",

}

TY - GEN

T1 - Etch Engineered InP Processing for a Fabrication Tolerant Slanted Waveguide

AU - Mehrabi, Kolsoom

AU - Pronk, Floris

AU - Bolk, Jeroen

AU - van der Tol, Jos J.G.M.

AU - Yao, Weiming

PY - 2025/12/22

Y1 - 2025/12/22

N2 - We present a process for fabrication-tolerant slanted waveguides used in photonic integrated devices requiring asymmetry. An etch-stop waveguide is positioned parallel to the main waveguide, enabling the self-limiting feature of bromine– methanol etching. A V-groove forms, allowing controlled etch termination. Demonstration is on InP waveguides.

AB - We present a process for fabrication-tolerant slanted waveguides used in photonic integrated devices requiring asymmetry. An etch-stop waveguide is positioned parallel to the main waveguide, enabling the self-limiting feature of bromine– methanol etching. A V-groove forms, allowing controlled etch termination. Demonstration is on InP waveguides.

U2 - 10.1109/IPC65510.2025.11281991

DO - 10.1109/IPC65510.2025.11281991

M3 - Conference contribution

BT - IEEE Photonics Conference, IPC

PB - Institute of Electrical and Electronics Engineers

T2 - 2025 IEEE Photonics Conference

Y2 - 9 November 2025 through 13 November 2025

ER -

Etch Engineered InP Processing for a Fabrication Tolerant Slanted Waveguide

Abstract

Conference

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