Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628))

Antonella Milella; Mariadriana Creatore; Michiel A. Blauw; Mauritius C.M. van de Sanden

doi:10.1002/ppap.200700127

Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628))

Antonella Milella, Mariadriana Creatore, Michiel A. Blauw, Mauritius C.M. van de Sanden

Research output: Contribution to journal › Comment/Letter to the editor › Academic › peer-review

Original language	English
Pages (from-to)	848-848
Number of pages	1
Journal	Plasma Processes and Polymers
Volume	4
Issue number	9
DOIs	https://doi.org/10.1002/ppap.200700127
Publication status	Published - 22 Nov 2007

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10.1002/ppap.200700127

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Milella, A., Creatore, M., Blauw, M. A., & van de Sanden, M. C. M. (2007). Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628)). Plasma Processes and Polymers, 4(9), 848-848. https://doi.org/10.1002/ppap.200700127

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title = "Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628))",

author = "Antonella Milella and Mariadriana Creatore and Blauw, {Michiel A.} and {van de Sanden}, {Mauritius C.M.}",

year = "2007",

month = nov,

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language = "English",

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pages = "848--848",

journal = "Plasma Processes and Polymers",

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Milella, A, Creatore, M, Blauw, MA & van de Sanden, MCM 2007, 'Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628))', Plasma Processes and Polymers, vol. 4, no. 9, pp. 848-848. https://doi.org/10.1002/ppap.200700127

Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628)). / Milella, Antonella; Creatore, Mariadriana; Blauw, Michiel A. et al.
In: Plasma Processes and Polymers, Vol. 4, No. 9, 22.11.2007, p. 848-848.

Research output: Contribution to journal › Comment/Letter to the editor › Academic › peer-review

TY - JOUR

T1 - Erratum

T2 - Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628))

AU - Milella, Antonella

AU - Creatore, Mariadriana

AU - Blauw, Michiel A.

AU - van de Sanden, Mauritius C.M.

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SN - 1612-8850

VL - 4

SP - 848

EP - 848

JO - Plasma Processes and Polymers

JF - Plasma Processes and Polymers

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ER -

Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628))

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