Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628))

Antonella Milella, Mariadriana Creatore, Michiel A. Blauw, Mauritius C.M. van de Sanden

Research output: Contribution to journalComment/Letter to the editorAcademicpeer-review

Original languageEnglish
Pages (from-to)848-848
Number of pages1
JournalPlasma Processes and Polymers
Issue number9
Publication statusPublished - 22 Nov 2007

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