Original language | English |
---|---|
Pages (from-to) | 848-848 |
Number of pages | 1 |
Journal | Plasma Processes and Polymers |
Volume | 4 |
Issue number | 9 |
DOIs |
|
Publication status | Published - 22 Nov 2007 |
Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628))
Antonella Milella, Mariadriana Creatore, Michiel A. Blauw, Mauritius C.M. van de Sanden
Research output: Contribution to journal › Comment/Letter to the editor › Academic › peer-review