Erratum: Ion-channeling analysis of boron clusters in silicon (Journal of Applied Physics (2001) 90 (4741))

L.J.M. Selen; F.J.J. Janssen; L.J. Van Ijzendoorn; M.J.A. De Voigt; M.J.J. Theunissen; P.J.M. Smulders; T.J. Eijkemans

doi:10.1063/1.1463446

Erratum: Ion-channeling analysis of boron clusters in silicon (Journal of Applied Physics (2001) 90 (4741))

L.J.M. Selen, F.J.J. Janssen, L.J. Van Ijzendoorn, M.J.A. De Voigt, M.J.J. Theunissen, P.J.M. Smulders, T.J. Eijkemans

Photonics and Semiconductor Nanophysics

Research output: Contribution to journal › Comment/Letter to the editor › Academic › peer-review

1 Citation (Scopus)

124 Downloads (Pure)

Original language	English
Pages (from-to)	5507
Number of pages	1
Journal	Journal of Applied Physics
Volume	91
Issue number	8
DOIs	https://doi.org/10.1063/1.1463446
Publication status	Published - 15 Apr 2002

Access to Document

10.1063/1.1463446

Metis232165Final published version, 11.1 KB

Cite this

@article{184b2effc8114618b0535dfa243d1345,

title = "Erratum: Ion-channeling analysis of boron clusters in silicon (Journal of Applied Physics (2001) 90 (4741))",

author = "L.J.M. Selen and F.J.J. Janssen and {Van Ijzendoorn}, L.J. and {De Voigt}, M.J.A. and M.J.J. Theunissen and P.J.M. Smulders and T.J. Eijkemans",

year = "2002",

month = apr,

day = "15",

doi = "10.1063/1.1463446",

language = "English",

volume = "91",

pages = "5507",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "8",

}

TY - JOUR

T1 - Erratum

T2 - Ion-channeling analysis of boron clusters in silicon (Journal of Applied Physics (2001) 90 (4741))

AU - Selen, L.J.M.

AU - Janssen, F.J.J.

AU - Van Ijzendoorn, L.J.

AU - De Voigt, M.J.A.

AU - Theunissen, M.J.J.

AU - Smulders, P.J.M.

AU - Eijkemans, T.J.

PY - 2002/4/15

Y1 - 2002/4/15

UR - http://www.scopus.com/inward/record.url?scp=0037091512&partnerID=8YFLogxK

U2 - 10.1063/1.1463446

DO - 10.1063/1.1463446

M3 - Comment/Letter to the editor

SN - 0021-8979

VL - 91

SP - 5507

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 8

ER -

Erratum: Ion-channeling analysis of boron clusters in silicon (Journal of Applied Physics (2001) 90 (4741))

Access to Document

Other files and links

Cite this