Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes

R. Knaapen; P. Poodt; R. Olieslagers; A. Lankhorst; M. Van Den Boer; Dennis van den Berg; A. Van Asten; F. Roozeboom

Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes

R. Knaapen
, P. Poodt
, R. Olieslagers
, A. Lankhorst
, M. Van Den Boer
, Dennis van den Berg
, A. Van Asten
, F. Roozeboom

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

1 Citation (Scopus)

93 Downloads (Pure)

Abstract

A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, and to separate reactants to enable a spatial ALD process. With a substrate speed of 1 m/min and drum rotational speed of 5 Hz, a layer of 100 nm of Al₂O₃ can be applied in a continuous roll-to-roll process at deposition rates of 1 nm/s. Higher speeds to ∼2 nm/s are foreseen to be possible.

Original language	English
Title of host publication	Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012
Publisher	European Society for Precision Engineering and Nanotechnology
Pages	36-39
Number of pages	4
Volume	1
ISBN (Electronic)	9780956679000
Publication status	Published - 1 Jan 2012
Event	12th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2012) - Stockholm, Sweden Duration: 4 Jun 2012 → 8 Jun 2012 Conference number: 12

Conference

Conference	12th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2012)
Abbreviated title	EUSPEN 2012
Country/Territory	Sweden
City	Stockholm
Period	4/06/12 → 8/06/12
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Knaapen, R., Poodt, P., Olieslagers, R., Lankhorst, A., Van Den Boer, M., van den Berg, D., Van Asten, A., & Roozeboom, F. (2012). Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes. In Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012 (Vol. 1, pp. 36-39). European Society for Precision Engineering and Nanotechnology.

@inproceedings{1eb39b7ada2449ce91b6cd40c0cea16c,

title = "Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes",

abstract = "A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, and to separate reactants to enable a spatial ALD process. With a substrate speed of 1 m/min and drum rotational speed of 5 Hz, a layer of 100 nm of Al2O3 can be applied in a continuous roll-to-roll process at deposition rates of 1 nm/s. Higher speeds to ∼2 nm/s are foreseen to be possible.",

author = "R. Knaapen and P. Poodt and R. Olieslagers and A. Lankhorst and \{Van Den Boer\}, M. and \{van den Berg\}, Dennis and \{Van Asten\}, A. and F. Roozeboom",

year = "2012",

month = jan,

day = "1",

language = "English",

volume = "1",

pages = "36--39",

booktitle = "Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012",

publisher = "European Society for Precision Engineering and Nanotechnology",

note = "12th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2012), EUSPEN 2012 ; Conference date: 04-06-2012 Through 08-06-2012",

}

Knaapen, R, Poodt, P, Olieslagers, R, Lankhorst, A, Van Den Boer, M, van den Berg, D, Van Asten, A & Roozeboom, F 2012, Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes. in Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012. vol. 1, European Society for Precision Engineering and Nanotechnology, pp. 36-39, 12th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2012), Stockholm, Sweden, 4/06/12.

Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes. / Knaapen, R.; Poodt, P.; Olieslagers, R. et al.
Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012. Vol. 1 European Society for Precision Engineering and Nanotechnology, 2012. p. 36-39.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes

AU - Knaapen, R.

AU - Poodt, P.

AU - Olieslagers, R.

AU - Lankhorst, A.

AU - Van Den Boer, M.

AU - van den Berg, Dennis

AU - Van Asten, A.

AU - Roozeboom, F.

N1 - Conference code: 12

PY - 2012/1/1

Y1 - 2012/1/1

N2 - A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, and to separate reactants to enable a spatial ALD process. With a substrate speed of 1 m/min and drum rotational speed of 5 Hz, a layer of 100 nm of Al2O3 can be applied in a continuous roll-to-roll process at deposition rates of 1 nm/s. Higher speeds to ∼2 nm/s are foreseen to be possible.

AB - A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, and to separate reactants to enable a spatial ALD process. With a substrate speed of 1 m/min and drum rotational speed of 5 Hz, a layer of 100 nm of Al2O3 can be applied in a continuous roll-to-roll process at deposition rates of 1 nm/s. Higher speeds to ∼2 nm/s are foreseen to be possible.

UR - https://www.scopus.com/pages/publications/84911387671

M3 - Conference contribution

AN - SCOPUS:84911387671

VL - 1

SP - 36

EP - 39

BT - Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012

PB - European Society for Precision Engineering and Nanotechnology

T2 - 12th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2012)

Y2 - 4 June 2012 through 8 June 2012

ER -

Knaapen R, Poodt P, Olieslagers R, Lankhorst A, Van Den Boer M, van den Berg D et al. Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes. In Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012. Vol. 1. European Society for Precision Engineering and Nanotechnology. 2012. p. 36-39

Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes

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