Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes

R. Knaapen, P. Poodt, R. Olieslagers, A. Lankhorst, M. Van Den Boer, D. Van Den Berg, A. Van Asten, F. Roozeboom

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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Abstract

A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, and to separate reactants to enable a spatial ALD process. With a substrate speed of 1 m/min and drum rotational speed of 5 Hz, a layer of 100 nm of Al2O3 can be applied in a continuous roll-to-roll process at deposition rates of 1 nm/s. Higher speeds to ∼2 nm/s are foreseen to be possible.

Original languageEnglish
Title of host publicationProceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012
PublisherEuropean Society for Precision Engineering and Nanotechnology
Pages36-39
Number of pages4
Volume1
ISBN (Electronic)9780956679000
Publication statusPublished - 1 Jan 2012
Event12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012 - Stockholm, Sweden
Duration: 4 Jun 20127 Jun 2012

Conference

Conference12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012
CountrySweden
CityStockholm
Period4/06/127/06/12

Fingerprint

Atomic layer deposition
atomic layer epitaxy
drums
Substrates
reactors
Gas bearings
gas bearings
Deposition rates
high speed

Cite this

Knaapen, R., Poodt, P., Olieslagers, R., Lankhorst, A., Van Den Boer, M., Van Den Berg, D., ... Roozeboom, F. (2012). Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes. In Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012 (Vol. 1, pp. 36-39). European Society for Precision Engineering and Nanotechnology.
Knaapen, R. ; Poodt, P. ; Olieslagers, R. ; Lankhorst, A. ; Van Den Boer, M. ; Van Den Berg, D. ; Van Asten, A. ; Roozeboom, F. / Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes. Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012. Vol. 1 European Society for Precision Engineering and Nanotechnology, 2012. pp. 36-39
@inproceedings{1eb39b7ada2449ce91b6cd40c0cea16c,
title = "Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes",
abstract = "A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, and to separate reactants to enable a spatial ALD process. With a substrate speed of 1 m/min and drum rotational speed of 5 Hz, a layer of 100 nm of Al2O3 can be applied in a continuous roll-to-roll process at deposition rates of 1 nm/s. Higher speeds to ∼2 nm/s are foreseen to be possible.",
author = "R. Knaapen and P. Poodt and R. Olieslagers and A. Lankhorst and {Van Den Boer}, M. and {Van Den Berg}, D. and {Van Asten}, A. and F. Roozeboom",
year = "2012",
month = "1",
day = "1",
language = "English",
volume = "1",
pages = "36--39",
booktitle = "Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012",
publisher = "European Society for Precision Engineering and Nanotechnology",

}

Knaapen, R, Poodt, P, Olieslagers, R, Lankhorst, A, Van Den Boer, M, Van Den Berg, D, Van Asten, A & Roozeboom, F 2012, Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes. in Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012. vol. 1, European Society for Precision Engineering and Nanotechnology, pp. 36-39, 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012, Stockholm, Sweden, 4/06/12.

Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes. / Knaapen, R.; Poodt, P.; Olieslagers, R.; Lankhorst, A.; Van Den Boer, M.; Van Den Berg, D.; Van Asten, A.; Roozeboom, F.

Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012. Vol. 1 European Society for Precision Engineering and Nanotechnology, 2012. p. 36-39.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

TY - GEN

T1 - Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes

AU - Knaapen, R.

AU - Poodt, P.

AU - Olieslagers, R.

AU - Lankhorst, A.

AU - Van Den Boer, M.

AU - Van Den Berg, D.

AU - Van Asten, A.

AU - Roozeboom, F.

PY - 2012/1/1

Y1 - 2012/1/1

N2 - A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, and to separate reactants to enable a spatial ALD process. With a substrate speed of 1 m/min and drum rotational speed of 5 Hz, a layer of 100 nm of Al2O3 can be applied in a continuous roll-to-roll process at deposition rates of 1 nm/s. Higher speeds to ∼2 nm/s are foreseen to be possible.

AB - A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, and to separate reactants to enable a spatial ALD process. With a substrate speed of 1 m/min and drum rotational speed of 5 Hz, a layer of 100 nm of Al2O3 can be applied in a continuous roll-to-roll process at deposition rates of 1 nm/s. Higher speeds to ∼2 nm/s are foreseen to be possible.

UR - http://www.scopus.com/inward/record.url?scp=84911387671&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:84911387671

VL - 1

SP - 36

EP - 39

BT - Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012

PB - European Society for Precision Engineering and Nanotechnology

ER -

Knaapen R, Poodt P, Olieslagers R, Lankhorst A, Van Den Boer M, Van Den Berg D et al. Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes. In Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012. Vol. 1. European Society for Precision Engineering and Nanotechnology. 2012. p. 36-39