Abstract
A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, and to separate reactants to enable a spatial ALD process. With a substrate speed of 1 m/min and drum rotational speed of 5 Hz, a layer of 100 nm of Al2O3 can be applied in a continuous roll-to-roll process at deposition rates of 1 nm/s. Higher speeds to ∼2 nm/s are foreseen to be possible.
Original language | English |
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Title of host publication | Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012 |
Publisher | European Society for Precision Engineering and Nanotechnology |
Pages | 36-39 |
Number of pages | 4 |
Volume | 1 |
ISBN (Electronic) | 9780956679000 |
Publication status | Published - 1 Jan 2012 |
Event | 12th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2012) - Stockholm, Sweden Duration: 4 Jun 2012 → 8 Jun 2012 Conference number: 12 |
Conference
Conference | 12th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2012) |
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Abbreviated title | EUSPEN 2012 |
Country/Territory | Sweden |
City | Stockholm |
Period | 4/06/12 → 8/06/12 |
Other |