Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes

R. Knaapen, P. Poodt, R. Olieslagers, A. Lankhorst, M. Van Den Boer, D. Van Den Berg, A. Van Asten, F. Roozeboom

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Citation (Scopus)
26 Downloads (Pure)

Abstract

A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, and to separate reactants to enable a spatial ALD process. With a substrate speed of 1 m/min and drum rotational speed of 5 Hz, a layer of 100 nm of Al2O3 can be applied in a continuous roll-to-roll process at deposition rates of 1 nm/s. Higher speeds to ∼2 nm/s are foreseen to be possible.

Original languageEnglish
Title of host publicationProceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012
PublisherEuropean Society for Precision Engineering and Nanotechnology
Pages36-39
Number of pages4
Volume1
ISBN (Electronic)9780956679000
Publication statusPublished - 1 Jan 2012
Event12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012 - Stockholm, Sweden
Duration: 4 Jun 20127 Jun 2012

Conference

Conference12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012
CountrySweden
CityStockholm
Period4/06/127/06/12

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