Enhanced lithographic resolution using longitudinal polarization state of light

My Phung Van, Katsiaryna Ushakova, Cees Bastiaansen, S.F. Pereira, H.P. Urbach, Dick Broer

Research output: Contribution to journalArticleAcademicpeer-review

1 Citation (Scopus)
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Abstract

Laser direct-writing is an important technique for the fabrication of complex patterns. There is a continuous need for structures with increasingly small features, i.e., enhanced resolution. Focused radially polarized light is known to exhibit a narrow longitudinal polarization component. Here, a proof-of-concept is shown of enhanced resolution through polarization-selectivity by the selective recording of the longitudinal polarization component in a polarization-selective homeotropic and smectic B photoresist. The full-width-at-half-maximum (FWHM) of the fabricated spots in the polarization-selective resist is up to 56% smaller compared to the FWHM of the same spot in a photoresist that is not polarization-selective, which supports simulations that predict a theoretical maximum reduction of 62%.
Original languageEnglish
Article number043509
Number of pages7
JournalJournal of Micro/Nanolithography, MEMS and MOEMS
Volume14
Issue number4
DOIs
Publication statusPublished - 2015

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Polarization
polarization
Photoresists
Full width at half maximum
photoresists
Light polarization
polarized light
selectivity
recording
Fabrication
fabrication
Lasers
lasers
simulation

Cite this

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title = "Enhanced lithographic resolution using longitudinal polarization state of light",
abstract = "Laser direct-writing is an important technique for the fabrication of complex patterns. There is a continuous need for structures with increasingly small features, i.e., enhanced resolution. Focused radially polarized light is known to exhibit a narrow longitudinal polarization component. Here, a proof-of-concept is shown of enhanced resolution through polarization-selectivity by the selective recording of the longitudinal polarization component in a polarization-selective homeotropic and smectic B photoresist. The full-width-at-half-maximum (FWHM) of the fabricated spots in the polarization-selective resist is up to 56{\%} smaller compared to the FWHM of the same spot in a photoresist that is not polarization-selective, which supports simulations that predict a theoretical maximum reduction of 62{\%}.",
author = "Van, {My Phung} and Katsiaryna Ushakova and Cees Bastiaansen and S.F. Pereira and H.P. Urbach and Dick Broer",
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language = "English",
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Enhanced lithographic resolution using longitudinal polarization state of light. / Van, My Phung; Ushakova, Katsiaryna; Bastiaansen, Cees; Pereira, S.F.; Urbach, H.P.; Broer, Dick.

In: Journal of Micro/Nanolithography, MEMS and MOEMS, Vol. 14, No. 4, 043509, 2015.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Enhanced lithographic resolution using longitudinal polarization state of light

AU - Van, My Phung

AU - Ushakova, Katsiaryna

AU - Bastiaansen, Cees

AU - Pereira, S.F.

AU - Urbach, H.P.

AU - Broer, Dick

PY - 2015

Y1 - 2015

N2 - Laser direct-writing is an important technique for the fabrication of complex patterns. There is a continuous need for structures with increasingly small features, i.e., enhanced resolution. Focused radially polarized light is known to exhibit a narrow longitudinal polarization component. Here, a proof-of-concept is shown of enhanced resolution through polarization-selectivity by the selective recording of the longitudinal polarization component in a polarization-selective homeotropic and smectic B photoresist. The full-width-at-half-maximum (FWHM) of the fabricated spots in the polarization-selective resist is up to 56% smaller compared to the FWHM of the same spot in a photoresist that is not polarization-selective, which supports simulations that predict a theoretical maximum reduction of 62%.

AB - Laser direct-writing is an important technique for the fabrication of complex patterns. There is a continuous need for structures with increasingly small features, i.e., enhanced resolution. Focused radially polarized light is known to exhibit a narrow longitudinal polarization component. Here, a proof-of-concept is shown of enhanced resolution through polarization-selectivity by the selective recording of the longitudinal polarization component in a polarization-selective homeotropic and smectic B photoresist. The full-width-at-half-maximum (FWHM) of the fabricated spots in the polarization-selective resist is up to 56% smaller compared to the FWHM of the same spot in a photoresist that is not polarization-selective, which supports simulations that predict a theoretical maximum reduction of 62%.

U2 - 10.1117/1.JMM.14.4.043509

DO - 10.1117/1.JMM.14.4.043509

M3 - Article

VL - 14

JO - Journal of Micro/Nanolithography, MEMS and MOEMS

JF - Journal of Micro/Nanolithography, MEMS and MOEMS

SN - 1932-5150

IS - 4

M1 - 043509

ER -