Enhanced lithographic resolution using longitudinal polarization state of light

My Phung Van, Katsiaryna Ushakova, Cees Bastiaansen, S.F. Pereira, H.P. Urbach, Dick Broer

Research output: Contribution to journalArticleAcademicpeer-review

1 Citation (Scopus)
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Abstract

Laser direct-writing is an important technique for the fabrication of complex patterns. There is a continuous need for structures with increasingly small features, i.e., enhanced resolution. Focused radially polarized light is known to exhibit a narrow longitudinal polarization component. Here, a proof-of-concept is shown of enhanced resolution through polarization-selectivity by the selective recording of the longitudinal polarization component in a polarization-selective homeotropic and smectic B photoresist. The full-width-at-half-maximum (FWHM) of the fabricated spots in the polarization-selective resist is up to 56% smaller compared to the FWHM of the same spot in a photoresist that is not polarization-selective, which supports simulations that predict a theoretical maximum reduction of 62%.
Original languageEnglish
Article number043509
Number of pages7
JournalJournal of Micro/Nanolithography, MEMS and MOEMS
Volume14
Issue number4
DOIs
Publication statusPublished - 2015

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