Abstract
A new method is presented for the glancing angle deposition (GLAD) of inorg. micro- and nanostructures using polymeric relief structures as seeding sites. Conventional embossing processes in thermoset resins were used to produce the relief structures, which potentially facilitates large scale prodn. array prodn. By using GLAD to control the film deposition conditions over these arrays, the authors have fabricated periodic lattices (2 mm periodicity) of both SiO2 pillars with a thickness of 1.58 mm and oblique Ni columns of thickness 0.60 mm. [on SciFinder (R)]
Original language | English |
---|---|
Pages (from-to) | 71-73 |
Journal | Nano Letters |
Volume | 1 |
Issue number | 2 |
DOIs | |
Publication status | Published - 2001 |