Ellipsometry of metal deposition

W. Visscher, A.P. Cox

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

The initial stages during galvanic deposition were monitored by ellipsometry in combination with cyclic voltammetry for the growth of Bi, Cu and Ge films on polycryst. Au, Pd and Pt substrates. The underpotential deposition (upd) of Bi on Au, of Ge on Pt and of Cu on Au could be detected ellipsometrically but not for Bi on Pd or Pt. The refractive index of the upd film of Bi on Au changes with increasing coverage. The bulk deposit film of Bi on Au and of Cu on Au grows at const. refractive index. [on SciFinder (R)]
Original languageEnglish
Pages (from-to)2245-2248
JournalElectrochimica Acta
Volume37
Issue number12
DOIs
Publication statusPublished - 1992

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