Electron densities in an RF etch plasma

T.H.J. Bisschops, R.F. Flipsen, D.C. Schram

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

25 Downloads (Pure)
Original languageEnglish
Title of host publicationISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1
EditorsK. Akashi, A. Kinbara
Place of PublicationTokyo
Pages620-624
Publication statusPublished - 1987

Cite this

Bisschops, T. H. J., Flipsen, R. F., & Schram, D. C. (1987). Electron densities in an RF etch plasma. In K. Akashi, & A. Kinbara (Eds.), ISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1 (pp. 620-624). Tokyo.