Original language | English |
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Title of host publication | ISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1 |
Editors | K. Akashi, A. Kinbara |
Place of Publication | Tokyo |
Pages | 620-624 |
Publication status | Published - 1987 |
Electron densities in an RF etch plasma
T.H.J. Bisschops, R.F. Flipsen, D.C. Schram
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic
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