Electron densities in an RF etch plasma

T.H.J. Bisschops; R.F. Flipsen; D.C. Schram

Electron densities in an RF etch plasma

T.H.J. Bisschops, R.F. Flipsen, D.C. Schram

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

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Original language	English
Title of host publication	ISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1
Editors	K. Akashi, A. Kinbara
Place of Publication	Tokyo
Pages	620-624
Publication status	Published - 1987

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590718Final published version, 202 KB

Cite this

Bisschops, T. H. J., Flipsen, R. F., & Schram, D. C. (1987). Electron densities in an RF etch plasma. In K. Akashi, & A. Kinbara (Eds.), ISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1 (pp. 620-624). Tokyo.

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title = "Electron densities in an RF etch plasma",

author = "T.H.J. Bisschops and R.F. Flipsen and D.C. Schram",

year = "1987",

language = "English",

pages = "620--624",

editor = "K. Akashi and A. Kinbara",

booktitle = "ISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1",

}