Electrochemistry of thin film battery materials prepared by low pressure chemical vapor deposition

J.F.M. Oudenhoven; T. Dongen, van; R.A.H. Niessen; M.H.J.M. Croon, de; P.H.L. Notten

Electrochemistry of thin film battery materials prepared by low pressure chemical vapor deposition

J.F.M. Oudenhoven, T. Dongen, van, R.A.H. Niessen, M.H.J.M. Croon, de, P.H.L. Notten

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

No abstract

Original language	English
Title of host publication	Proceedings of ICTF14 & RSD2008 : Ghent, Belgium, 17-20 November 2008
Editors	R. De Gryse, D. Depla, D. Poelman, S. Mathieu, W.P. Leroy, H. Poelman
Place of Publication	Ghent
Pages	32-35
Publication status	Published - 2008
Event	conference; International Conference on Thin Films (ICTF), Ghent Reactive Sputter Deposition Symposium (RSD); 2008-11-17; 2008-11-20 - Duration: 17 Nov 2008 → 20 Nov 2008

Conference

Conference	conference; International Conference on Thin Films (ICTF), Ghent Reactive Sputter Deposition Symposium (RSD); 2008-11-17; 2008-11-20
Period	17/11/08 → 20/11/08
Other	International Conference on Thin Films (ICTF), Ghent Reactive Sputter Deposition Symposium (RSD)

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Oudenhoven, J. F. M., Dongen, van, T., Niessen, R. A. H., Croon, de, M. H. J. M., & Notten, P. H. L. (2008). Electrochemistry of thin film battery materials prepared by low pressure chemical vapor deposition. In R. De Gryse, D. Depla, D. Poelman, S. Mathieu, W. P. Leroy, & H. Poelman (Eds.), Proceedings of ICTF14 & RSD2008 : Ghent, Belgium, 17-20 November 2008 (pp. 32-35).

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title = "Electrochemistry of thin film battery materials prepared by low pressure chemical vapor deposition",

abstract = "No abstract",

author = "J.F.M. Oudenhoven and {Dongen, van}, T. and R.A.H. Niessen and {Croon, de}, M.H.J.M. and P.H.L. Notten",

year = "2008",

language = "English",

isbn = "978-90-334-7347-0",

pages = "32--35",

editor = "{De Gryse}, R. and D. Depla and D. Poelman and S. Mathieu and W.P. Leroy and H. Poelman",

booktitle = "Proceedings of ICTF14 & RSD2008 : Ghent, Belgium, 17-20 November 2008",

note = "conference; International Conference on Thin Films (ICTF), Ghent Reactive Sputter Deposition Symposium (RSD); 2008-11-17; 2008-11-20 ; Conference date: 17-11-2008 Through 20-11-2008",

}

Oudenhoven, JFM, Dongen, van, T, Niessen, RAH, Croon, de, MHJM & Notten, PHL 2008, Electrochemistry of thin film battery materials prepared by low pressure chemical vapor deposition. in R De Gryse, D Depla, D Poelman, S Mathieu, WP Leroy & H Poelman (eds), Proceedings of ICTF14 & RSD2008 : Ghent, Belgium, 17-20 November 2008. Ghent, pp. 32-35, conference; International Conference on Thin Films (ICTF), Ghent Reactive Sputter Deposition Symposium (RSD); 2008-11-17; 2008-11-20, 17/11/08.

Electrochemistry of thin film battery materials prepared by low pressure chemical vapor deposition. / Oudenhoven, J.F.M.; Dongen, van, T.; Niessen, R.A.H. et al.

Proceedings of ICTF14 & RSD2008 : Ghent, Belgium, 17-20 November 2008. ed. / R. De Gryse; D. Depla; D. Poelman; S. Mathieu; W.P. Leroy; H. Poelman. Ghent, 2008. p. 32-35.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Electrochemistry of thin film battery materials prepared by low pressure chemical vapor deposition

AU - Oudenhoven, J.F.M.

AU - Dongen, van, T.

AU - Niessen, R.A.H.

AU - Croon, de, M.H.J.M.

AU - Notten, P.H.L.

PY - 2008

Y1 - 2008

N2 - No abstract

AB - No abstract

M3 - Conference contribution

SN - 978-90-334-7347-0

SP - 32

EP - 35

BT - Proceedings of ICTF14 & RSD2008 : Ghent, Belgium, 17-20 November 2008

A2 - De Gryse, R.

A2 - Depla, D.

A2 - Poelman, D.

A2 - Mathieu, S.

A2 - Leroy, W.P.

A2 - Poelman, H.

CY - Ghent

T2 - conference; International Conference on Thin Films (ICTF), Ghent Reactive Sputter Deposition Symposium (RSD); 2008-11-17; 2008-11-20

Y2 - 17 November 2008 through 20 November 2008

ER -

Electrochemistry of thin film battery materials prepared by low pressure chemical vapor deposition

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