In this study, the boriding of titanium via molten salt electrolysis was investigated in borax based electrolyte at various current densities (50–700 mA/cm2), temperatures (900–1200°C) and process durations (1 min-4 h). Thin film XRD results revealed that two main titanium boride phases TiB2 and TiB was formed even after 1 minute of process time. Scanning electron microscopy (SEM) images conducted on the cross-sections demonstrated a bilayer boride structure composed of a continuous uniform TiB2 phase and TiB whiskers that grew below the TiB2 layer toward the substrate. Dependence of boride layer thickness and morphology on the process parameters was evaluated. The results of the study showed that temperature of boriding was the most critical parameter both on boriding rate and morphology of the boride layer. It was possible to grow 8 μm thick TiB2 layer on titanium in 30 minutes of boriding at 1200°C.