Effect of hydrogen on the sputter rate of multilayer mirrors in extreme ultra-violet lithography

M.H.L. Velden, van der, J.J.A.M. Mullen, van der, R. Moors

Research output: Contribution to conferencePosterAcademic

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Abstract

No abstract.
Original languageEnglish
Pages-B26
Publication statusPublished - 2008

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lithography
mirrors
hydrogen

Bibliographical note

Poster presented at the 20st Symposium Plasma Physics & Radiation Technology 2008, 4-5 March 2008, Lunteren, The Netherlands

Cite this

Velden, van der, M. H. L., Mullen, van der, J. J. A. M., & Moors, R. (2008). Effect of hydrogen on the sputter rate of multilayer mirrors in extreme ultra-violet lithography. -B26.
Velden, van der, M.H.L. ; Mullen, van der, J.J.A.M. ; Moors, R. / Effect of hydrogen on the sputter rate of multilayer mirrors in extreme ultra-violet lithography.
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note = "Poster presented at the 20st Symposium Plasma Physics & Radiation Technology 2008, 4-5 March 2008, Lunteren, The Netherlands",
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Velden, van der, MHL, Mullen, van der, JJAM & Moors, R 2008, 'Effect of hydrogen on the sputter rate of multilayer mirrors in extreme ultra-violet lithography' pp. -B26.

Effect of hydrogen on the sputter rate of multilayer mirrors in extreme ultra-violet lithography. / Velden, van der, M.H.L.; Mullen, van der, J.J.A.M.; Moors, R.

2008. -B26.

Research output: Contribution to conferencePosterAcademic

TY - CONF

T1 - Effect of hydrogen on the sputter rate of multilayer mirrors in extreme ultra-violet lithography

AU - Velden, van der, M.H.L.

AU - Mullen, van der, J.J.A.M.

AU - Moors, R.

N1 - Poster presented at the 20st Symposium Plasma Physics & Radiation Technology 2008, 4-5 March 2008, Lunteren, The Netherlands

PY - 2008

Y1 - 2008

N2 - No abstract.

AB - No abstract.

M3 - Poster

SP - -B26

ER -