Effect of hydrogen on the sputter rate of multilayer mirrors in extreme ultra-violet lithography

M.H.L. Velden, van der, J.J.A.M. Mullen, van der, R. Moors

Research output: Contribution to conferencePoster

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Abstract

No abstract.
Original languageEnglish
Pages-B26
Publication statusPublished - 2008

Bibliographical note

Poster presented at the 20st Symposium Plasma Physics & Radiation Technology 2008, 4-5 March 2008, Lunteren, The Netherlands

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