ECS Transactions: preface

V. Narayanan, F. Roozeboom, D.L. Kwong, H. Iwai, E.P. Gusev, P.J. Timans

Research output: Contribution to journalEditorialAcademicpeer-review

Original languageEnglish
JournalECS Transactions
Issue number1
Publication statusPublished - 1 Dec 2009
EventInternational Symposium on Advanced Gate Stack, Source/Drain and Channel Engineering for Si-based CMOS: New Materials, Processes and Equipment - 215th ECS Meeting - San Francisco, CA, United States
Duration: 24 May 200929 May 2009

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