Dust void formation above rectangular and circular potential traps in an rf plasma

R.J. Vrancken, G.V. Paeva, G.M.W. Kroesen, W.W. Stoffels

Research output: Contribution to journalArticleAcademicpeer-review

5 Citations (Scopus)
Original languageEnglish
Pages (from-to)509-516
JournalPlasma Sources Science and Technology
Volume14
Issue number3
DOIs
Publication statusPublished - 2005

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