Dry etching and profiling of SiGe-alloys

G.S. Oehrlein, G.M.W. Kroesen, Y. Zhang, E. Frésart, de

Research output: Contribution to journalArticleAcademicpeer-review

Original languageEnglish
Pages (from-to)193-201
JournalProceedings of Japanese Symposium on Plasma Chemistry
Volume4
Publication statusPublished - 1991

Cite this