| Original language | English |
|---|---|
| Pages (from-to) | 193-201 |
| Journal | Proceedings of Japanese Symposium on Plasma Chemistry |
| Volume | 4 |
| Publication status | Published - 1991 |
Dry etching and profiling of SiGe-alloys
G.S. Oehrlein, G.M.W. Kroesen, Y. Zhang, E. Frésart, de
Research output: Contribution to journal › Article › Academic › peer-review