Downstream deposition of carbon nitride thin film using an RF plasma jet

G. Dinescu, E. Aldea, P. Boieriu, G. Musa, A. Andrei, V. Sandu, G.J.H. Brussaard, R.J. Severens, M.C.M. Sanden, van de, D.C. Schram

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Abstract

The synthesis and the deposition of C nitride thin films with a new technique, downstream deposition from a RF generated, capacitively coupled N plasma beam with C electrodes are reported. The films obtained at room temp. are amorphous and contain C to N bonding, as revealed by XRD and FTIR studies. [on SciFinder (R)]
Original languageEnglish
Pages (from-to)309-313
JournalRomanian Reports in Physics
Volume49
Issue number3-4
Publication statusPublished - 1997

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    Dinescu, G., Aldea, E., Boieriu, P., Musa, G., Andrei, A., Sandu, V., Brussaard, G. J. H., Severens, R. J., Sanden, van de, M. C. M., & Schram, D. C. (1997). Downstream deposition of carbon nitride thin film using an RF plasma jet. Romanian Reports in Physics, 49(3-4), 309-313.