Directional repetitive control of a metrological AFM

R.J.E. Merry, M.J.C. Ronde, M.J.G. Molengraft, van de, K.R. Koops, M. Steinbuch

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

Atomic force microscopes (AFMs) are used for sample imaging and characterization at nanometer scale. In this work, we consider a metrological AFM, which is used for the calibration of transfer standards for commercial AFMs. The metrological AFM uses a three degree-of-freedom (DOF) stage to move the sample with respect to the probe of the AFM. The repetitive sample topography introduce repetitive disturbances in the system. To suppress these disturbances, repetitive control (RC) is applied to the imaging axis. A rotated sample orientation with respect to the actuation axes introduces a non-repetitiveness in the originally fully repetitive errors and yields a deteriorated performance of RC. Directional repetitive control is introduced to align the axes of the scanning movement with the sample orientation under the microscope. Experiments show that the proposed directional repetitive controller significantly reduces the tracking error as compared to standard repetitive control.
Original languageEnglish
Title of host publication5th IFAC Symposium on Mechatronic Systems, 13-15 September 2012, Cambridge, Massachussetts
EditorsG. T. -C Chiu, K. Youcef-Toumi
Place of PublicationOxford
PublisherPergamon
Pages206-211
DOIs
Publication statusPublished - 2010
Eventconference; 5th IFAC Symposium on Mechatronic Systems; 2010-09-13; 2010-09-15 -
Duration: 13 Sep 201015 Sep 2010

Conference

Conferenceconference; 5th IFAC Symposium on Mechatronic Systems; 2010-09-13; 2010-09-15
Period13/09/1015/09/10
Other5th IFAC Symposium on Mechatronic Systems

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