Direct and indirect NO removal with (sub)nanosecond pulses : yield and by-product formation

Research output: Contribution to conferenceAbstractAcademic

Abstract

In this contribution we show results of direct and indirect removal of nitric oxide (NO) with (sub)nanosecond pulses. The nanosecond pulse source is the 0.5-10-ns, 0-50-kV (positive and negative), 0.2-ns rise time pulse source that we recently developed at Eindhoven University of Technology. The direct-removal setup is an in-plasma removal setup, where the polluted air (with NO) is flushed directly through a pulsed corona plasma generated with the nanosecond pulses. In the indirect-removal setup, we generate ozone in clean air in the corona plasma reactor and mix this with the polluted gas stream after the plasma reactor. In this method, NO is removed by reaction with ozone and not directly in the plasma. We report on removal yields and by-product formation.
Original languageEnglish
Publication statusPublished - 19 Jun 2017
Event21st IEEE Pulsed Power Conference (PPC 2017), June 18-22, 2017, Brighton, UK - Hilton Metropole, Brighton, United Kingdom
Duration: 18 Jun 201722 Jun 2017
http://ece-events.unm.edu/ppc2017/

Conference

Conference21st IEEE Pulsed Power Conference (PPC 2017), June 18-22, 2017, Brighton, UK
Abbreviated titlePPC 2017
CountryUnited Kingdom
CityBrighton
Period18/06/1722/06/17
Internet address

Fingerprint

nitric oxide
pulses
coronas
ozone
reactors
gas streams
air

Cite this

Huiskamp, T., Beckers, F. J. C. M., Hoeben, W. F. L. M., Pemen, A. J. M., & van Heesch, E. J. M. (2017). Direct and indirect NO removal with (sub)nanosecond pulses : yield and by-product formation. Abstract from 21st IEEE Pulsed Power Conference (PPC 2017), June 18-22, 2017, Brighton, UK, Brighton, United Kingdom.
Huiskamp, T. ; Beckers, F.J.C.M. ; Hoeben, W.F.L.M. ; Pemen, A.J.M. ; van Heesch, E.J.M. / Direct and indirect NO removal with (sub)nanosecond pulses : yield and by-product formation. Abstract from 21st IEEE Pulsed Power Conference (PPC 2017), June 18-22, 2017, Brighton, UK, Brighton, United Kingdom.
@conference{d1638b034da1475a9025a61d71af8bd0,
title = "Direct and indirect NO removal with (sub)nanosecond pulses : yield and by-product formation",
abstract = "In this contribution we show results of direct and indirect removal of nitric oxide (NO) with (sub)nanosecond pulses. The nanosecond pulse source is the 0.5-10-ns, 0-50-kV (positive and negative), 0.2-ns rise time pulse source that we recently developed at Eindhoven University of Technology. The direct-removal setup is an in-plasma removal setup, where the polluted air (with NO) is flushed directly through a pulsed corona plasma generated with the nanosecond pulses. In the indirect-removal setup, we generate ozone in clean air in the corona plasma reactor and mix this with the polluted gas stream after the plasma reactor. In this method, NO is removed by reaction with ozone and not directly in the plasma. We report on removal yields and by-product formation.",
author = "T. Huiskamp and F.J.C.M. Beckers and W.F.L.M. Hoeben and A.J.M. Pemen and {van Heesch}, E.J.M.",
year = "2017",
month = "6",
day = "19",
language = "English",
note = "21st IEEE Pulsed Power Conference (PPC 2017), June 18-22, 2017, Brighton, UK, PPC 2017 ; Conference date: 18-06-2017 Through 22-06-2017",
url = "http://ece-events.unm.edu/ppc2017/",

}

Huiskamp, T, Beckers, FJCM, Hoeben, WFLM, Pemen, AJM & van Heesch, EJM 2017, 'Direct and indirect NO removal with (sub)nanosecond pulses : yield and by-product formation' 21st IEEE Pulsed Power Conference (PPC 2017), June 18-22, 2017, Brighton, UK, Brighton, United Kingdom, 18/06/17 - 22/06/17, .

Direct and indirect NO removal with (sub)nanosecond pulses : yield and by-product formation. / Huiskamp, T.; Beckers, F.J.C.M.; Hoeben, W.F.L.M.; Pemen, A.J.M.; van Heesch, E.J.M.

2017. Abstract from 21st IEEE Pulsed Power Conference (PPC 2017), June 18-22, 2017, Brighton, UK, Brighton, United Kingdom.

Research output: Contribution to conferenceAbstractAcademic

TY - CONF

T1 - Direct and indirect NO removal with (sub)nanosecond pulses : yield and by-product formation

AU - Huiskamp, T.

AU - Beckers, F.J.C.M.

AU - Hoeben, W.F.L.M.

AU - Pemen, A.J.M.

AU - van Heesch, E.J.M.

PY - 2017/6/19

Y1 - 2017/6/19

N2 - In this contribution we show results of direct and indirect removal of nitric oxide (NO) with (sub)nanosecond pulses. The nanosecond pulse source is the 0.5-10-ns, 0-50-kV (positive and negative), 0.2-ns rise time pulse source that we recently developed at Eindhoven University of Technology. The direct-removal setup is an in-plasma removal setup, where the polluted air (with NO) is flushed directly through a pulsed corona plasma generated with the nanosecond pulses. In the indirect-removal setup, we generate ozone in clean air in the corona plasma reactor and mix this with the polluted gas stream after the plasma reactor. In this method, NO is removed by reaction with ozone and not directly in the plasma. We report on removal yields and by-product formation.

AB - In this contribution we show results of direct and indirect removal of nitric oxide (NO) with (sub)nanosecond pulses. The nanosecond pulse source is the 0.5-10-ns, 0-50-kV (positive and negative), 0.2-ns rise time pulse source that we recently developed at Eindhoven University of Technology. The direct-removal setup is an in-plasma removal setup, where the polluted air (with NO) is flushed directly through a pulsed corona plasma generated with the nanosecond pulses. In the indirect-removal setup, we generate ozone in clean air in the corona plasma reactor and mix this with the polluted gas stream after the plasma reactor. In this method, NO is removed by reaction with ozone and not directly in the plasma. We report on removal yields and by-product formation.

M3 - Abstract

ER -

Huiskamp T, Beckers FJCM, Hoeben WFLM, Pemen AJM, van Heesch EJM. Direct and indirect NO removal with (sub)nanosecond pulses : yield and by-product formation. 2017. Abstract from 21st IEEE Pulsed Power Conference (PPC 2017), June 18-22, 2017, Brighton, UK, Brighton, United Kingdom.