Direct and High-Throughput Fabrication of Mie-Resonant Metasurfaces via Single-Pulse Laser Interference

Jonas Berzinš (Corresponding author), Simonas Indrišiūnas, Koen Van Erve, Arvind Nagarajan, Stefan Fasold, Michael Steinert, Giampiero Gerini, Paulius Gečys, Thomas Pertsch, Stefan M.B. Bäumer, Frank Setzpfandt

Research output: Contribution to journalArticleAcademicpeer-review

29 Citations (Scopus)


High-index dielectric metasurfaces featuring Mie-type electric and magnetic resonances have been of great interest in a variety of applications such as imaging, sensing, photovoltaics, and others, which led to the necessity of an efficient large-scale fabrication technique. To address this, here we demonstrate the use of single-pulse laser interference for direct patterning of an amorphous silicon film into an array of Mie resonators a few hundred nanometers in diameter. The proposed technique is based on laser-interference-induced dewetting. A precise control of the laser pulse energy enables the fabrication of ordered dielectric metasurfaces in areas spanning tens of micrometers and consisting of thousands of hemispherical nanoparticles with a single laser shot. The fabricated nanoparticles exhibit a wavelength-dependent optical response with a strong electric dipole signature. Variation of the predeposited silicon film thickness allows tailoring of the resonances in the targeted visible and infrared spectral ranges. Such direct and high-throughput fabrication is a step toward a simple realization of spatially invariant metasurface-based devices.

Original languageEnglish
Pages (from-to)6138-6149
Number of pages12
JournalACS Nano
Issue number5
Publication statusPublished - 26 May 2020


  • dielectric nanostructures
  • direct laser interference patterning
  • laser-matter interaction
  • metasurfaces
  • multibeam interference
  • silicon resonators


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