Device and method for generating a plasma discharge for patterning the surface of a substrate

P.M. Blom (Inventor), A.A.E. Stevens (Inventor), Laura Huijbregts (Inventor), H.A.M. De Haan (Inventor), A.H. Van Schijndel (Inventor), E Te Sligte (Inventor), C.J. Van Hijningen (Inventor), T. Huiskamp (Inventor)

Research output: PatentPatent publication

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Abstract

Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.
Original languageEnglish
Patent numberWO2011102711 (A1)
Priority date17/02/10
Publication statusPublished - 25 Aug 2011

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