Development and understanding of advanced atomic layer deposition processes: AlF3, Co, and Ru

Martinus Franciscus Johannes Vos

Research output: ThesisPhd Thesis 1 (Research TU/e / Graduation TU/e)

36 Downloads (Pure)
Original languageEnglish
QualificationDoctor of Philosophy
Awarding Institution
  • Applied Physics
Supervisors/Advisors
  • Kessels, W.M.M. (Erwin), Promotor
  • Mackus, Adrie J.M., Copromotor
Award date21 Nov 2019
Place of PublicationEindhoven
Publisher
Print ISBNs978-90-386-4900-9
Publication statusPublished - 21 Nov 2019

Bibliographical note

Proefschrift

Promotion : time and place

  • 13.30h, Atlas, room 0.710

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