Development and understanding of advanced atomic layer deposition processes: AlF3, Co, and Ru

Development and understanding of advanced atomic layer deposition processes: AlF₃, Co, and Ru

Martinus Franciscus Johannes Vos

Research output: Thesis › Phd Thesis 1 (Research TU/e / Graduation TU/e)

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Original language	English
Qualification	Doctor of Philosophy
Awarding Institution	Applied Physics and Science Education
Supervisors/Advisors	Kessels, W.M.M. (Erwin), Promotor Mackus, Adrie J.M., Copromotor
Award date	21 Nov 2019
Place of Publication	Eindhoven
Publisher	Technische Universiteit Eindhoven
Print ISBNs	978-90-386-4900-9
Publication status	Published - 21 Nov 2019

Proefschrift

@phdthesis{5443dcd876aa463386eb58ca0121740c,

title = "Development and understanding of advanced atomic layer deposition processes: AlF3, Co, and Ru",

author = "Vos, {Martinus Franciscus Johannes}",

note = "Proefschrift",

year = "2019",

month = nov,

day = "21",

language = "English",

isbn = "978-90-386-4900-9",

publisher = "Technische Universiteit Eindhoven",

type = "Phd Thesis 1 (Research TU/e / Graduation TU/e)",

school = "Applied Physics and Science Education",

}