Determination of spin-dependent scattering parameters of NiFe/Cu and Co/Cu multilayers

S.K.J. Lenczowski, M.A.M. Gijs, R.J.M. van de Veerdonk, J.B. Giesbers, W.J.M. de Jonge

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    Abstract

    We present magnetoresistance (MR) data of high-vacuum magnetron sputtered NiFe/Cu multilayers (NiFe=NisoFe20) grown on Si(lOO) substrates with a Cu buffer layer and compare these with earlier results on Co/Cu(lOO) multilayers [1]. Measured MR values are directly proportional to the antiferromagnetically coupled fraction in the multilayers. Extrapolating to full antiparallel alignment, we can make a reliable comparison of the MR wrt,h the magnetoresistance model of Levy,
    Zhang, and Fert [2,3]. For the NiFe/Cu multilayers the deduced spin-asymmetry parameters are a~iFe/Cu = 5.0 ± 0.4 and a~iFe = 2.1 ± 0.3 for interface and bulk scattering, respectively. Although much smaller than in our Co/Cu multilayers, where afo/Cu = 21 ± 3 and af0 = 2.6 ± 0.3, .it is still the spin dependence of the interface scattering that is the main cause for the large MR values.
    Original languageEnglish
    Title of host publicationMagnetic ultrathin films, multilayers and surfaces : symposium held April 17-20, 1995, San Francisco, California, U.S.A.
    EditorsE.E. Marinero, B. Heinrich, W.F. Egelhoff
    Place of PublicationPitsburgh
    PublisherMaterials Research Society
    Pages341-346
    Number of pages6
    ISBN (Print)1-55899-287-1
    DOIs
    Publication statusPublished - 1 Dec 1995
    Event1995 MRS Spring Meeting - San Francisco, United States
    Duration: 18 Apr 199521 Apr 1995
    https://www.mrs.org/spring1995

    Publication series

    NameMaterials Research Society Symposium - Proceedings
    Volume384
    ISSN (Print)0272-9172

    Conference

    Conference1995 MRS Spring Meeting
    Country/TerritoryUnited States
    CitySan Francisco
    Period18/04/9521/04/95
    Internet address

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