Design of a suspended silicon substrate heater and its application to novel studies of carbon nanotube growth

L.C. van Laake; A.J. Hart; A.H. Slocum

Design of a suspended silicon substrate heater and its application to novel studies of carbon nanotube growth

L.C. van Laake
, A.J. Hart
, A.H. Slocum

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

We present a simple and novel apparatus for growth of carbon nanotubes (CNTs) by chemical vapour deposition (CVD) using a resistively heated silicon substrate. The substrate is suspended in the gas flow, resulting in low thermal mass and enabling rapid continuous control of the substrate temperature: heating and cooling rates of 100°C/s are achieved. The separation of gas (pre-) heating temperature and substrate temperature results in much improved growth rate and ultimate length of vertically aligned multi-walled nanotubes (VA-CNT) compared to a conventional setup using a tube furnace. Using optical photography we monitor the height and morphology of VA-CNT films as they grow, revealing a constant growth rate in experiments at 800°C in C₂H₄/H₂/Ar and C₂H₄/H₂/CO.

Original language	English
Title of host publication	Proceedings of the 6th International Conference European Society for Precision Engineering and Nanotechnology, EUSPEN 2006
Editors	H. Zervos
Place of Publication	Bedford
Publisher	European Society for Precision Engineering and Nanotechnology
Pages	381-384
Number of pages	4
ISBN (Print)	9780955308208, 0-9553082-0-8
Publication status	Published - 2006
Externally published	Yes
Event	6th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2006) - Baden bei Wien, Austria Duration: 28 May 2006 → 1 Jun 2006 Conference number: 6

Conference

Conference	6th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2006)
Abbreviated title	EUSPEN 2006
Country/Territory	Austria
City	Baden bei Wien
Period	28/05/06 → 1/06/06

Cite this

van Laake, L. C., Hart, A. J., & Slocum, A. H. (2006). Design of a suspended silicon substrate heater and its application to novel studies of carbon nanotube growth. In H. Zervos (Ed.), Proceedings of the 6th International Conference European Society for Precision Engineering and Nanotechnology, EUSPEN 2006 (pp. 381-384). European Society for Precision Engineering and Nanotechnology.

van Laake, L.C. ; Hart, A.J. ; Slocum, A.H. / Design of a suspended silicon substrate heater and its application to novel studies of carbon nanotube growth. Proceedings of the 6th International Conference European Society for Precision Engineering and Nanotechnology, EUSPEN 2006. editor / H. Zervos. Bedford : European Society for Precision Engineering and Nanotechnology, 2006. pp. 381-384

@inproceedings{b3f42d46aa32440ebcb6c2ad4c59a784,

title = "Design of a suspended silicon substrate heater and its application to novel studies of carbon nanotube growth",

abstract = "We present a simple and novel apparatus for growth of carbon nanotubes (CNTs) by chemical vapour deposition (CVD) using a resistively heated silicon substrate. The substrate is suspended in the gas flow, resulting in low thermal mass and enabling rapid continuous control of the substrate temperature: heating and cooling rates of 100°C/s are achieved. The separation of gas (pre-) heating temperature and substrate temperature results in much improved growth rate and ultimate length of vertically aligned multi-walled nanotubes (VA-CNT) compared to a conventional setup using a tube furnace. Using optical photography we monitor the height and morphology of VA-CNT films as they grow, revealing a constant growth rate in experiments at 800°C in C2H4/H2/Ar and C2H4/H2/CO.",

author = "\{van Laake\}, L.C. and A.J. Hart and A.H. Slocum",

year = "2006",

language = "English",

isbn = "9780955308208",

pages = "381--384",

editor = "H. Zervos",

booktitle = "Proceedings of the 6th International Conference European Society for Precision Engineering and Nanotechnology, EUSPEN 2006",

publisher = "European Society for Precision Engineering and Nanotechnology",

note = "6th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2006), EUSPEN 2006 ; Conference date: 28-05-2006 Through 01-06-2006",

}

van Laake, LC, Hart, AJ & Slocum, AH 2006, Design of a suspended silicon substrate heater and its application to novel studies of carbon nanotube growth. in H Zervos (ed.), Proceedings of the 6th International Conference European Society for Precision Engineering and Nanotechnology, EUSPEN 2006. European Society for Precision Engineering and Nanotechnology, Bedford, pp. 381-384, 6th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2006), Baden bei Wien, Austria, 28/05/06.

Design of a suspended silicon substrate heater and its application to novel studies of carbon nanotube growth. / van Laake, L.C.; Hart, A.J.; Slocum, A.H.
Proceedings of the 6th International Conference European Society for Precision Engineering and Nanotechnology, EUSPEN 2006. ed. / H. Zervos. Bedford: European Society for Precision Engineering and Nanotechnology, 2006. p. 381-384.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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T1 - Design of a suspended silicon substrate heater and its application to novel studies of carbon nanotube growth

AU - van Laake, L.C.

AU - Hart, A.J.

AU - Slocum, A.H.

N1 - Conference code: 6

PY - 2006

Y1 - 2006

N2 - We present a simple and novel apparatus for growth of carbon nanotubes (CNTs) by chemical vapour deposition (CVD) using a resistively heated silicon substrate. The substrate is suspended in the gas flow, resulting in low thermal mass and enabling rapid continuous control of the substrate temperature: heating and cooling rates of 100°C/s are achieved. The separation of gas (pre-) heating temperature and substrate temperature results in much improved growth rate and ultimate length of vertically aligned multi-walled nanotubes (VA-CNT) compared to a conventional setup using a tube furnace. Using optical photography we monitor the height and morphology of VA-CNT films as they grow, revealing a constant growth rate in experiments at 800°C in C2H4/H2/Ar and C2H4/H2/CO.

AB - We present a simple and novel apparatus for growth of carbon nanotubes (CNTs) by chemical vapour deposition (CVD) using a resistively heated silicon substrate. The substrate is suspended in the gas flow, resulting in low thermal mass and enabling rapid continuous control of the substrate temperature: heating and cooling rates of 100°C/s are achieved. The separation of gas (pre-) heating temperature and substrate temperature results in much improved growth rate and ultimate length of vertically aligned multi-walled nanotubes (VA-CNT) compared to a conventional setup using a tube furnace. Using optical photography we monitor the height and morphology of VA-CNT films as they grow, revealing a constant growth rate in experiments at 800°C in C2H4/H2/Ar and C2H4/H2/CO.

UR - https://www.scopus.com/pages/publications/84908342274

M3 - Conference contribution

AN - SCOPUS:84908342274

SN - 9780955308208

SN - 0-9553082-0-8

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EP - 384

BT - Proceedings of the 6th International Conference European Society for Precision Engineering and Nanotechnology, EUSPEN 2006

A2 - Zervos, H.

PB - European Society for Precision Engineering and Nanotechnology

CY - Bedford

T2 - 6th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2006)

Y2 - 28 May 2006 through 1 June 2006

ER -

van Laake LC, Hart AJ, Slocum AH. Design of a suspended silicon substrate heater and its application to novel studies of carbon nanotube growth. In Zervos H, editor, Proceedings of the 6th International Conference European Society for Precision Engineering and Nanotechnology, EUSPEN 2006. Bedford: European Society for Precision Engineering and Nanotechnology. 2006. p. 381-384

Design of a suspended silicon substrate heater and its application to novel studies of carbon nanotube growth

Abstract

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