Deposition of SiOx : films from hexamehtyldisiloxane/oxygen radiofrequency glow discharges: process optimization by plasma diagnostics

M. Creatore, F. Palumbo, R. Agostino, d'

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68 Citations (Scopus)
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Abstract

Optical emission and Fourier transform infrared absorption diagnostics have been carried out in hexamethyldisiloxane/oxygen RF discharges for studying the effects of the feed composition and the power on the deposition of SiO2—like thin films. Ex situ FTIR absorption has been utilized to monitor organic moieties and silanol groups in the film. It is shown that carbon-free films can be obtained by highly diluting the monomer in oxygen, while medium-to-high power is necessary to abate silanol groups. These two conditions represent the optimization criterion to obtain excellent barrier films for food packaging applications.
Original languageEnglish
Pages (from-to)291-310
JournalPlasmas and Polymers
Volume7
Issue number3
DOIs
Publication statusPublished - 2002

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