Deposition of silicon oxide films using a remote thermal plasma

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Original language	English
Title of host publication	AVS, American Vacuum Society : 46th international symposium, Seattle, October 25-29, 1999 : virtual proceedings
Pages	TF-MoM10-
Publication status	Published - 1999

Cite this

@inproceedings{b2551729fdd64f15ab5286e8da7108f4,

title = "Deposition of silicon oxide films using a remote thermal plasma",

author = "{Sanden, van de}, M.C.M. and {Hest, van}, M.F.A.M. and D.C. Schram",

year = "1999",

language = "English",

pages = "TF--MoM10--",

booktitle = "AVS, American Vacuum Society : 46th international symposium, Seattle, October 25-29, 1999 : virtual proceedings",

}