Deposition of silicon oxide films by means of a remote thermal plasma

M.F.A.M. Hest, van; M.C.M. Sanden, van de; D.C. Schram

Deposition of silicon oxide films by means of a remote thermal plasma

M.F.A.M. Hest, van, M.C.M. Sanden, van de, D.C. Schram

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

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Original language	English
Title of host publication	Proceedings of the CIP '99, 12th International Colloquium on Plasma Processes : June 6 - 10, 1999, Antibes - Juan-les-Pins, France
Place of Publication	Paris
Publisher	Société Française du Vide
Pages	259-261
Publication status	Published - 1999
Event	CIP '99 : International Colloquium on Plasma Processes ; 12 - Juan-les-Pins Duration: 6 Jun 1999 → 10 Jun 1999

Publication series

Name	Vide: Science, Technique et Applications
Volume	291
ISSN (Print)	1266-0167

Conference

Conference	CIP '99 : International Colloquium on Plasma Processes ; 12
City	Juan-les-Pins
Period	6/06/99 → 10/06/99
Other

Cite this

Hest, van, M. F. A. M., Sanden, van de, M. C. M., & Schram, D. C. (1999). Deposition of silicon oxide films by means of a remote thermal plasma. In Proceedings of the CIP '99, 12th International Colloquium on Plasma Processes : June 6 - 10, 1999, Antibes - Juan-les-Pins, France (pp. 259-261). (Vide: Science, Technique et Applications; Vol. 291). Société Française du Vide.

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title = "Deposition of silicon oxide films by means of a remote thermal plasma",

author = "{Hest, van}, M.F.A.M. and {Sanden, van de}, M.C.M. and D.C. Schram",

year = "1999",

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publisher = "Soci{\'e}t{\'e} Fran{\c c}aise du Vide",

pages = "259--261",

booktitle = "Proceedings of the CIP '99, 12th International Colloquium on Plasma Processes : June 6 - 10, 1999, Antibes - Juan-les-Pins, France",

address = "France",

note = "CIP '99 : International Colloquium on Plasma Processes ; 12 ; Conference date: 06-06-1999 Through 10-06-1999",

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Hest, van, MFAM, Sanden, van de, MCM & Schram, DC 1999, Deposition of silicon oxide films by means of a remote thermal plasma. in Proceedings of the CIP '99, 12th International Colloquium on Plasma Processes : June 6 - 10, 1999, Antibes - Juan-les-Pins, France. Vide: Science, Technique et Applications, vol. 291, Société Française du Vide, Paris, pp. 259-261, CIP '99 : International Colloquium on Plasma Processes ; 12, Juan-les-Pins, 6/06/99.

Deposition of silicon oxide films by means of a remote thermal plasma. / Hest, van, M.F.A.M.; Sanden, van de, M.C.M.; Schram, D.C.
Proceedings of the CIP '99, 12th International Colloquium on Plasma Processes : June 6 - 10, 1999, Antibes - Juan-les-Pins, France. Paris: Société Française du Vide, 1999. p. 259-261 (Vide: Science, Technique et Applications; Vol. 291).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

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T1 - Deposition of silicon oxide films by means of a remote thermal plasma

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AU - Sanden, van de, M.C.M.

AU - Schram, D.C.

PY - 1999

Y1 - 1999

M3 - Conference contribution

T3 - Vide: Science, Technique et Applications

SP - 259

EP - 261

BT - Proceedings of the CIP '99, 12th International Colloquium on Plasma Processes : June 6 - 10, 1999, Antibes - Juan-les-Pins, France

PB - Société Française du Vide

CY - Paris

T2 - CIP '99 : International Colloquium on Plasma Processes ; 12

Y2 - 6 June 1999 through 10 June 1999

ER -