Deposition of amorphous silicon by the "chemical annealing" technique in a conventional rf reactor

W.G.J.H.M. Sark, van, P.G. Vliet, van de, J. Bezemer, M. Kars, W.F. Weg, van der

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Original languageEnglish
Title of host publicationProceedings 9th international colloquium on plasma processes, June 6-11, 1993, Antibes, Juan-les-Pins, France
Place of PublicationParis
PublisherSociété Française du Vide
Pages72-74
Publication statusPublished - 1993
Externally publishedYes

Publication series

NameLe vide, les couches minces
Volumesuppl. 266

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