Deposition of a-Si:H by an expanding argon-hydrogen-silane plasma : plasma chemistry and film growth

M.C.M. Sanden, van de; W.M.M. Kessels; R.J. Severens; G.M. Janssen; D.C. Schram

Deposition of a-Si:H by an expanding argon-hydrogen-silane plasma : plasma chemistry and film growth

M.C.M. Sanden, van de, W.M.M. Kessels, R.J. Severens, G.M. Janssen, D.C. Schram

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

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Original language	English
Title of host publication	Abstract presented at the TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg
Pages	305
Publication status	Published - 1998
Event	conference; TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg; 1998-07-13; 1998-07-16 - Duration: 13 Jul 1998 → 16 Jul 1998

Conference

Conference	conference; TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg; 1998-07-13; 1998-07-16
Period	13/07/98 → 16/07/98
Other	TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg

Cite this

@inproceedings{08f3e2f363584422b3e66bcb65eab2f0,

title = "Deposition of a-Si:H by an expanding argon-hydrogen-silane plasma : plasma chemistry and film growth",

author = "{Sanden, van de}, M.C.M. and W.M.M. Kessels and R.J. Severens and G.M. Janssen and D.C. Schram",

year = "1998",

language = "English",

pages = "305",

booktitle = "Abstract presented at the TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg",

note = "conference; TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg; 1998-07-13; 1998-07-16 ; Conference date: 13-07-1998 Through 16-07-1998",

}

Sanden, van de, MCM , Kessels, WMM, Severens, RJ, Janssen, GM & Schram, DC 1998, Deposition of a-Si:H by an expanding argon-hydrogen-silane plasma : plasma chemistry and film growth. in Abstract presented at the TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg. pp. 305, conference; TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg; 1998-07-13; 1998-07-16, 13/07/98.

Deposition of a-Si:H by an expanding argon-hydrogen-silane plasma : plasma chemistry and film growth. / Sanden, van de, M.C.M.; Kessels, W.M.M.; Severens, R.J. et al.
Abstract presented at the TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg. 1998. p. 305.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - Deposition of a-Si:H by an expanding argon-hydrogen-silane plasma : plasma chemistry and film growth

AU - Sanden, van de, M.C.M.

AU - Kessels, W.M.M.

AU - Severens, R.J.

AU - Janssen, G.M.

AU - Schram, D.C.

PY - 1998

Y1 - 1998

M3 - Conference contribution

SP - 305

BT - Abstract presented at the TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg

T2 - conference; TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg; 1998-07-13; 1998-07-16

Y2 - 13 July 1998 through 16 July 1998

ER -