Deposition of a-Si:H by an expanding argon-hydrogen-silane plasma : plasma chemistry and film growth

M.C.M. Sanden, van de, W.M.M. Kessels, R.J. Severens, G.M. Janssen, D.C. Schram

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Original languageEnglish
Title of host publicationAbstract presented at the TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg
Pages305
Publication statusPublished - 1998
Eventconference; TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg; 1998-07-13; 1998-07-16 -
Duration: 13 Jul 199816 Jul 1998

Conference

Conferenceconference; TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg; 1998-07-13; 1998-07-16
Period13/07/9816/07/98
OtherTPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg

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