Deposition of a-C:H films : plasma chemistry and material properties

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Original language	English
Title of host publication	AVS, American Vacuum Society : 48th international symposium, San Francisco, October 28-November 2, 2001 : virtual proceedings
Publication status	Published - 2001

Cite this

@inproceedings{3fada38483d54350881dc98f4fb6f77b,

title = "Deposition of a-C:H films : plasma chemistry and material properties",

author = "J. Benedikt and K.G.Y. Letourneur and M. Wisse and D.C. Schram and \{Sanden, van de\}, M.C.M.",

year = "2001",

language = "English",

booktitle = "AVS, American Vacuum Society : 48th international symposium, San Francisco, October 28-November 2, 2001 : virtual proceedings",

}

TY - GEN

T1 - Deposition of a-C:H films : plasma chemistry and material properties

AU - Benedikt, J.

AU - Letourneur, K.G.Y.

AU - Wisse, M.

AU - Schram, D.C.

AU - Sanden, van de, M.C.M.

PY - 2001

Y1 - 2001

M3 - Conference contribution

BT - AVS, American Vacuum Society : 48th international symposium, San Francisco, October 28-November 2, 2001 : virtual proceedings

ER -