Delamination modeling of three-dimensional microelectronic systems

O. Sluis, van der, P.H.M. Timmermans, R.B.R. Silfhout, van, W.D. Driel, van, G.Q. Zhang

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

3 Citations (Scopus)

Abstract

Thermo-mechanical reliability issues are major bottlenecks in the development of future microelectronic components. Numerical modeling can provide more fundamental understanding of these failure phenomena. As a results, predicting, and ultimately, preventing these phenomena will result in an increased reliability of current and future electronic products. In this paper, delamination phenomena occurring in Cu/low-k back-end structures, buckling-driven delamination in flexible electronicsand peeling tests on stretchable electronics will be modeled and validated by experimental results. For the Cu/low-k back-end structures, failure sensitivity analysis is performed by the recently developed Area Release Energy (ARE) method while transient delamination processes are described by cohesivezone elements in the critical regions. For the latter, a dedicated solver is applied that is able to deal with brittle interfaces. For the flexible and stretchable electronics applications, cohesivezones are used to characterize the interface properties by combining numerical results with experimental measurements.
Original languageEnglish
Title of host publicationProceedings of the Electronic Components and Technology Conference (ECTC 2008), United States, Orlando
Pages1593-1600
Publication statusPublished - 2008

Fingerprint

Dive into the research topics of 'Delamination modeling of three-dimensional microelectronic systems'. Together they form a unique fingerprint.

Cite this