Deep etched DBR gratings in InP for photonic integrated circuits

B. Docter, E.J. Geluk, F. Karouta, M.K. Smit

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

10 Citations (Scopus)
1 Downloads (Pure)

Abstract

A novel fabrication process for the realization of deep-etched DBR gratings in InP is presented. It is shown that a combination of chromium and SiOx provides a very resistant etching mask for Cl2-based ICP etching. Both e-beam and optical lithography are used to limit e-beam writing time.
Original languageEnglish
Title of host publicationProceedings of the 13th European Conference on Integrated Optics (ECIO 2007) 25-27 April 2007, Copenhagen, Denmark
PagesThG20-1/3
Publication statusPublished - 2007
Event13th European Conference on Integrated Optics (ECIO 2007) - Copenhagen, Denmark
Duration: 25 Apr 200727 Apr 2007
Conference number: 13

Conference

Conference13th European Conference on Integrated Optics (ECIO 2007)
Abbreviated titleECIO 2007
CountryDenmark
CityCopenhagen
Period25/04/0727/04/07

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