Deep dry etching process development for InP-based photonic crystals

R.W. Heijden, van der; E.W.J.M. Drift, van der; E.J. Geluk; F. Karouta; P.A.M. Nouwens; Y.S. Oei; H.W.M. Salemink

Deep dry etching process development for InP-based photonic crystals

R.W. Heijden, van der, E.W.J.M. Drift, van der, E.J. Geluk, F. Karouta, P.A.M. Nouwens, Y.S. Oei, H.W.M. Salemink

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	Proceedings of the 13th annual symposium of the IEEE/LEOS Benelux Chapter, 27-28 November 2008, Enschede, The Netherlands
Place of Publication	Piscataway
Publisher	Institute of Electrical and Electronics Engineers
Pages	257-260
ISBN (Print)	90-365-1990-X
Publication status	Published - 2003
Event	8th Annual Symposium of the IEEE/LEOS Benelux Chapter, November 20-21, 2003, Enschede, Netherlands - Enschede, Netherlands Duration: 20 Nov 2003 → 21 Nov 2003

Conference

Conference	8th Annual Symposium of the IEEE/LEOS Benelux Chapter, November 20-21, 2003, Enschede, Netherlands
Country/Territory	Netherlands
City	Enschede
Period	20/11/03 → 21/11/03

Cite this

Heijden, van der, R. W., Drift, van der, E. W. J. M., Geluk, E. J., Karouta, F., Nouwens, P. A. M., Oei, Y. S., & Salemink, H. W. M. (2003). Deep dry etching process development for InP-based photonic crystals. In Proceedings of the 13th annual symposium of the IEEE/LEOS Benelux Chapter, 27-28 November 2008, Enschede, The Netherlands (pp. 257-260). Institute of Electrical and Electronics Engineers.

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title = "Deep dry etching process development for InP-based photonic crystals",

author = "{Heijden, van der}, R.W. and {Drift, van der}, E.W.J.M. and E.J. Geluk and F. Karouta and P.A.M. Nouwens and Y.S. Oei and H.W.M. Salemink",

year = "2003",

language = "English",

isbn = "90-365-1990-X",

pages = "257--260",

booktitle = "Proceedings of the 13th annual symposium of the IEEE/LEOS Benelux Chapter, 27-28 November 2008, Enschede, The Netherlands",

publisher = "Institute of Electrical and Electronics Engineers",

address = "United States",

note = "8th Annual Symposium of the IEEE/LEOS Benelux Chapter, November 20-21, 2003, Enschede, Netherlands ; Conference date: 20-11-2003 Through 21-11-2003",

}

Heijden, van der, RW, Drift, van der, EWJM, Geluk, EJ, Karouta, F, Nouwens, PAM, Oei, YS & Salemink, HWM 2003, Deep dry etching process development for InP-based photonic crystals. in Proceedings of the 13th annual symposium of the IEEE/LEOS Benelux Chapter, 27-28 November 2008, Enschede, The Netherlands. Institute of Electrical and Electronics Engineers, Piscataway, pp. 257-260, 8th Annual Symposium of the IEEE/LEOS Benelux Chapter, November 20-21, 2003, Enschede, Netherlands, Enschede, Netherlands, 20/11/03.

Deep dry etching process development for InP-based photonic crystals. / Heijden, van der, R.W.; Drift, van der, E.W.J.M.; Geluk, E.J. et al.
Proceedings of the 13th annual symposium of the IEEE/LEOS Benelux Chapter, 27-28 November 2008, Enschede, The Netherlands. Piscataway: Institute of Electrical and Electronics Engineers, 2003. p. 257-260.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Deep dry etching process development for InP-based photonic crystals

AU - Heijden, van der, R.W.

AU - Drift, van der, E.W.J.M.

AU - Geluk, E.J.

AU - Karouta, F.

AU - Nouwens, P.A.M.

AU - Oei, Y.S.

AU - Salemink, H.W.M.

PY - 2003

Y1 - 2003

M3 - Conference contribution

SN - 90-365-1990-X

SP - 257

EP - 260

BT - Proceedings of the 13th annual symposium of the IEEE/LEOS Benelux Chapter, 27-28 November 2008, Enschede, The Netherlands

PB - Institute of Electrical and Electronics Engineers

CY - Piscataway

T2 - 8th Annual Symposium of the IEEE/LEOS Benelux Chapter, November 20-21, 2003, Enschede, Netherlands

Y2 - 20 November 2003 through 21 November 2003

ER -