Conversion from Al to Al2O3 of subnanometer barriers for magnetic tunnel junctions monitored in real time

C.G.C.H.M. Fabrie, J.T. Kohlhepp, H.J.M. Swagten, B. Koopmans, W.J.M. Jonge, de

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

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Abstract

In situ differential ellipsometry measurements are used to investigate the plasma oxidation dynamics of subnanometer Al layers in real time. An analysis of the measured oxidation rate allows us to monitor the conversion from Al to Al2O3 in real time and mark the onset of the CoFe electrode oxidation. In situ x-ray photoelectron spectroscopy (XPS) measurements of identical samples that were plasma oxidized for 3 s are used to confirm the ellipsometry results. A linear relationship was found between the amount of Al2O3 determined from the XPS data and the amount of oxidized Al derived from the ellipsometry data. From this, we conclude that the conversion from Al to Al2O3 of subnanometer thin barriers for magnetic tunnel junctions can be observed by using the derivative of the ellipsometer signal.
Original languageEnglish
Title of host publicationProceedings of the 50th Annual Conference on Magnetism & Magnetic Materials, 30 October - 3 November 2005, San José, California, USA
Pages08T303-1/3
DOIs
Publication statusPublished - 2005
Eventconference; 50th Annual Conference on Magnetism & Magnetic Materials; 2005-10-30; 2005-11-03 -
Duration: 30 Oct 20053 Nov 2005

Publication series

NameJournal of Applied Physics
Number8, part 3
Volume99
ISSN (Print)0021-8979

Conference

Conferenceconference; 50th Annual Conference on Magnetism & Magnetic Materials; 2005-10-30; 2005-11-03
Period30/10/053/11/05
Other50th Annual Conference on Magnetism & Magnetic Materials

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