Controlling the silicon nitride film density for ultrahigh-rate deposition of top quality antireflection coatings

W. M.M. Kessels; P.J. van den Oever; B. Hoex; R. C.M. Bosch; A. J.M. van Erven; M. D. Bijker; M. C.M. van de Sanden

doi:10.1109/PVSC.2005.1488367

Controlling the silicon nitride film density for ultrahigh-rate deposition of top quality antireflection coatings

W. M.M. Kessels, P.J. van den Oever, B. Hoex, R. C.M. Bosch, A. J.M. van Erven, M. D. Bijker, M. C.M. van de Sanden

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

4 Citations (Scopus)

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Abstract

In this contribution we address the importance of a high mass density for silicon nitride films used as an antireflection coating on crystalline silicon solar cells. Two approaches for finding the optimized deposition conditions are presented. The outcome of these optimization studies clearly show that both the bulk and surface passivation benefit from a high mass density and that top quality antireflection coatings can be obtained at deposition rates up to 5 nm/s.

Original language	English
Title of host publication	Thirty-first IEEE Photovoltaic Specialists Conference, 2005
Place of Publication	Piscataway
Publisher	Institute of Electrical and Electronics Engineers
Pages	1253-1256
Number of pages	4
ISBN (Print)	0-7803-8707-4
DOIs	https://doi.org/10.1109/PVSC.2005.1488367
Publication status	Published - 30 Nov 2005
Event	31st IEEE Photovoltaic Specialists Conference (PVSC 2005) - Coronado Springs Resort, Lake Buena Vista, United States Duration: 3 Jan 2005 → 7 Jan 2005 Conference number: 31

Conference

Conference	31st IEEE Photovoltaic Specialists Conference (PVSC 2005)
Abbreviated title	PVSC 2005
Country/Territory	United States
City	Lake Buena Vista
Period	3/01/05 → 7/01/05

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10.1109/PVSC.2005.1488367

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Kessels, W. M. M., van den Oever, P. J., Hoex, B., Bosch, R. C. M., van Erven, A. J. M., Bijker, M. D., & van de Sanden, M. C. M. (2005). Controlling the silicon nitride film density for ultrahigh-rate deposition of top quality antireflection coatings. In Thirty-first IEEE Photovoltaic Specialists Conference, 2005 (pp. 1253-1256). Institute of Electrical and Electronics Engineers. https://doi.org/10.1109/PVSC.2005.1488367

@inproceedings{aafe2f86cd0047878c936764adcfa056,

title = "Controlling the silicon nitride film density for ultrahigh-rate deposition of top quality antireflection coatings",

abstract = "In this contribution we address the importance of a high mass density for silicon nitride films used as an antireflection coating on crystalline silicon solar cells. Two approaches for finding the optimized deposition conditions are presented. The outcome of these optimization studies clearly show that both the bulk and surface passivation benefit from a high mass density and that top quality antireflection coatings can be obtained at deposition rates up to 5 nm/s.",

author = "Kessels, {W. M.M.} and {van den Oever}, P.J. and B. Hoex and Bosch, {R. C.M.} and {van Erven}, {A. J.M.} and Bijker, {M. D.} and {van de Sanden}, {M. C.M.}",

year = "2005",

month = nov,

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doi = "10.1109/PVSC.2005.1488367",

language = "English",

isbn = "0-7803-8707-4 ",

pages = "1253--1256",

booktitle = "Thirty-first IEEE Photovoltaic Specialists Conference, 2005",

publisher = "Institute of Electrical and Electronics Engineers",

address = "United States",

note = "31st IEEE Photovoltaic Specialists Conference (PVSC 2005), PVSC 2005 ; Conference date: 03-01-2005 Through 07-01-2005",

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Kessels, WMM, van den Oever, PJ, Hoex, B, Bosch, RCM, van Erven, AJM, Bijker, MD & van de Sanden, MCM 2005, Controlling the silicon nitride film density for ultrahigh-rate deposition of top quality antireflection coatings. in Thirty-first IEEE Photovoltaic Specialists Conference, 2005. Institute of Electrical and Electronics Engineers, Piscataway, pp. 1253-1256, 31st IEEE Photovoltaic Specialists Conference (PVSC 2005), Lake Buena Vista, Florida, United States, 3/01/05. https://doi.org/10.1109/PVSC.2005.1488367

Controlling the silicon nitride film density for ultrahigh-rate deposition of top quality antireflection coatings. / Kessels, W. M.M.; van den Oever, P.J.; Hoex, B. et al.

Thirty-first IEEE Photovoltaic Specialists Conference, 2005. Piscataway : Institute of Electrical and Electronics Engineers, 2005. p. 1253-1256.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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AU - van den Oever, P.J.

AU - Hoex, B.

AU - Bosch, R. C.M.

AU - van Erven, A. J.M.

AU - Bijker, M. D.

AU - van de Sanden, M. C.M.

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N2 - In this contribution we address the importance of a high mass density for silicon nitride films used as an antireflection coating on crystalline silicon solar cells. Two approaches for finding the optimized deposition conditions are presented. The outcome of these optimization studies clearly show that both the bulk and surface passivation benefit from a high mass density and that top quality antireflection coatings can be obtained at deposition rates up to 5 nm/s.

AB - In this contribution we address the importance of a high mass density for silicon nitride films used as an antireflection coating on crystalline silicon solar cells. Two approaches for finding the optimized deposition conditions are presented. The outcome of these optimization studies clearly show that both the bulk and surface passivation benefit from a high mass density and that top quality antireflection coatings can be obtained at deposition rates up to 5 nm/s.

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M3 - Conference contribution

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BT - Thirty-first IEEE Photovoltaic Specialists Conference, 2005

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Kessels WMM, van den Oever PJ, Hoex B, Bosch RCM, van Erven AJM, Bijker MD et al. Controlling the silicon nitride film density for ultrahigh-rate deposition of top quality antireflection coatings. In Thirty-first IEEE Photovoltaic Specialists Conference, 2005. Piscataway: Institute of Electrical and Electronics Engineers. 2005. p. 1253-1256 doi: 10.1109/PVSC.2005.1488367

Controlling the silicon nitride film density for ultrahigh-rate deposition of top quality antireflection coatings

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