Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing

V. Beladiya, T. Faraz, W.M.M. Kessels, A. Tünnermann, A. Szeghalmi

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

Complex interference multilayer systems typically implemented in high-performance optics consists of several layers of low and high refractive index materials. Low mechanical stress of the coatings is desired to avoid cracking and delamination of the film or a deformation of the substrate. It is known that the ion energies in plasma-assisted deposition can be employed to control material properties and thereby mechanical stress. In this study, we evaluate the influence of substrate biasing on mechanical stress and optical properties of alumina (Al2O3) coatings deposited by plasma enhanced atomic layer deposition (PEALD). Substrate biasing up to -300 V was applied during O2 plasma exposure in the second step of a two-step PEALD process. To distinguish the physical effect of ion bombardment from the physico-chemical effect, a substrate bias of -100 V was applied separately and only during Ar plasma exposure that constituted the third step of a three-step PEALD process. Al2O3 films were characterized using spectroscopic ellipsometry, spectrophotometry, xray photoelectron spectroscopy (XPS), x-ray diffractometry (XRD), x-ray reflectometry (XRR), Fourier transform infrared spectroscopy (FT-IR), wafer-curvature measurement and atomic force microscopy (AFM).

LanguageEnglish
Title of host publicationAdvances in Optical Thin Films VI
PublisherSPIE
ISBN (Print)9781510619197
DOIs
StatePublished - 1 Jan 2018
EventAdvances in Optical Thin Films VI 2018 - Frankfurt, Germany
Duration: 14 May 201817 May 2018

Publication series

NameProceedings of SPIE
Volume10691

Conference

ConferenceAdvances in Optical Thin Films VI 2018
CountryGermany
CityFrankfurt
Period14/05/1817/05/18

Fingerprint

Atomic layer deposition
atomic layer epitaxy
Structural Properties
Optical Properties
Mechanical Properties
Thin Films
Structural properties
Plasma
Optical properties
Substrate
mechanical properties
Plasmas
optical properties
Thin films
Mechanical properties
Mechanical Stress
Substrates
thin films
Coating
Spectroscopic Ellipsometry

Keywords

  • aluminum oxide
  • atomic layer deposition
  • ellipsometry
  • Fourier transform infrared spectroscopy
  • mechanical stress
  • optical loss
  • plasma ALD
  • substrate biasing
  • XPS

Cite this

Beladiya, V., Faraz, T., Kessels, W. M. M., Tünnermann, A., & Szeghalmi, A. (2018). Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing. In Advances in Optical Thin Films VI [106910E] (Proceedings of SPIE; Vol. 10691). SPIE. DOI: 10.1117/12.2312516
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abstract = "Complex interference multilayer systems typically implemented in high-performance optics consists of several layers of low and high refractive index materials. Low mechanical stress of the coatings is desired to avoid cracking and delamination of the film or a deformation of the substrate. It is known that the ion energies in plasma-assisted deposition can be employed to control material properties and thereby mechanical stress. In this study, we evaluate the influence of substrate biasing on mechanical stress and optical properties of alumina (Al2O3) coatings deposited by plasma enhanced atomic layer deposition (PEALD). Substrate biasing up to -300 V was applied during O2 plasma exposure in the second step of a two-step PEALD process. To distinguish the physical effect of ion bombardment from the physico-chemical effect, a substrate bias of -100 V was applied separately and only during Ar plasma exposure that constituted the third step of a three-step PEALD process. Al2O3 films were characterized using spectroscopic ellipsometry, spectrophotometry, xray photoelectron spectroscopy (XPS), x-ray diffractometry (XRD), x-ray reflectometry (XRR), Fourier transform infrared spectroscopy (FT-IR), wafer-curvature measurement and atomic force microscopy (AFM).",
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Beladiya, V, Faraz, T, Kessels, WMM, Tünnermann, A & Szeghalmi, A 2018, Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing. in Advances in Optical Thin Films VI., 106910E, Proceedings of SPIE, vol. 10691, SPIE, Advances in Optical Thin Films VI 2018, Frankfurt, Germany, 14/05/18. DOI: 10.1117/12.2312516

Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing. / Beladiya, V.; Faraz, T.; Kessels, W.M.M.; Tünnermann, A.; Szeghalmi, A.

Advances in Optical Thin Films VI. SPIE, 2018. 106910E (Proceedings of SPIE; Vol. 10691).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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BT - Advances in Optical Thin Films VI

PB - SPIE

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Beladiya V, Faraz T, Kessels WMM, Tünnermann A, Szeghalmi A. Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing. In Advances in Optical Thin Films VI. SPIE. 2018. 106910E. (Proceedings of SPIE). Available from, DOI: 10.1117/12.2312516