Abstract
Complex interference multilayer systems typically implemented in high-performance optics consists of several layers of low and high refractive index materials. Low mechanical stress of the coatings is desired to avoid cracking and delamination of the film or a deformation of the substrate. It is known that the ion energies in plasma-assisted deposition can be employed to control material properties and thereby mechanical stress. In this study, we evaluate the influence of substrate biasing on mechanical stress and optical properties of alumina (Al2O3) coatings deposited by plasma enhanced atomic layer deposition (PEALD). Substrate biasing up to -300 V was applied during O2 plasma exposure in the second step of a two-step PEALD process. To distinguish the physical effect of ion bombardment from the physico-chemical effect, a substrate bias of -100 V was applied separately and only during Ar plasma exposure that constituted the third step of a three-step PEALD process. Al2O3 films were characterized using spectroscopic ellipsometry, spectrophotometry, xray photoelectron spectroscopy (XPS), x-ray diffractometry (XRD), x-ray reflectometry (XRR), Fourier transform infrared spectroscopy (FT-IR), wafer-curvature measurement and atomic force microscopy (AFM).
| Language | English |
|---|---|
| Title of host publication | Advances in Optical Thin Films VI |
| Publisher | SPIE |
| ISBN (Print) | 9781510619197 |
| DOIs | |
| State | Published - 1 Jan 2018 |
| Event | Advances in Optical Thin Films VI 2018 - Frankfurt, Germany Duration: 14 May 2018 → 17 May 2018 |
Publication series
| Name | Proceedings of SPIE |
|---|---|
| Volume | 10691 |
Conference
| Conference | Advances in Optical Thin Films VI 2018 |
|---|---|
| Country | Germany |
| City | Frankfurt |
| Period | 14/05/18 → 17/05/18 |
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Keywords
- aluminum oxide
- atomic layer deposition
- ellipsometry
- Fourier transform infrared spectroscopy
- mechanical stress
- optical loss
- plasma ALD
- substrate biasing
- XPS
Cite this
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Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing. / Beladiya, V.; Faraz, T.; Kessels, W.M.M.; Tünnermann, A.; Szeghalmi, A.
Advances in Optical Thin Films VI. SPIE, 2018. 106910E (Proceedings of SPIE; Vol. 10691).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
TY - GEN
T1 - Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
AU - Beladiya,V.
AU - Faraz,T.
AU - Kessels,W.M.M.
AU - Tünnermann,A.
AU - Szeghalmi,A.
PY - 2018/1/1
Y1 - 2018/1/1
N2 - Complex interference multilayer systems typically implemented in high-performance optics consists of several layers of low and high refractive index materials. Low mechanical stress of the coatings is desired to avoid cracking and delamination of the film or a deformation of the substrate. It is known that the ion energies in plasma-assisted deposition can be employed to control material properties and thereby mechanical stress. In this study, we evaluate the influence of substrate biasing on mechanical stress and optical properties of alumina (Al2O3) coatings deposited by plasma enhanced atomic layer deposition (PEALD). Substrate biasing up to -300 V was applied during O2 plasma exposure in the second step of a two-step PEALD process. To distinguish the physical effect of ion bombardment from the physico-chemical effect, a substrate bias of -100 V was applied separately and only during Ar plasma exposure that constituted the third step of a three-step PEALD process. Al2O3 films were characterized using spectroscopic ellipsometry, spectrophotometry, xray photoelectron spectroscopy (XPS), x-ray diffractometry (XRD), x-ray reflectometry (XRR), Fourier transform infrared spectroscopy (FT-IR), wafer-curvature measurement and atomic force microscopy (AFM).
AB - Complex interference multilayer systems typically implemented in high-performance optics consists of several layers of low and high refractive index materials. Low mechanical stress of the coatings is desired to avoid cracking and delamination of the film or a deformation of the substrate. It is known that the ion energies in plasma-assisted deposition can be employed to control material properties and thereby mechanical stress. In this study, we evaluate the influence of substrate biasing on mechanical stress and optical properties of alumina (Al2O3) coatings deposited by plasma enhanced atomic layer deposition (PEALD). Substrate biasing up to -300 V was applied during O2 plasma exposure in the second step of a two-step PEALD process. To distinguish the physical effect of ion bombardment from the physico-chemical effect, a substrate bias of -100 V was applied separately and only during Ar plasma exposure that constituted the third step of a three-step PEALD process. Al2O3 films were characterized using spectroscopic ellipsometry, spectrophotometry, xray photoelectron spectroscopy (XPS), x-ray diffractometry (XRD), x-ray reflectometry (XRR), Fourier transform infrared spectroscopy (FT-IR), wafer-curvature measurement and atomic force microscopy (AFM).
KW - aluminum oxide
KW - atomic layer deposition
KW - ellipsometry
KW - Fourier transform infrared spectroscopy
KW - mechanical stress
KW - optical loss
KW - plasma ALD
KW - substrate biasing
KW - XPS
UR - http://www.scopus.com/inward/record.url?scp=85052293883&partnerID=8YFLogxK
U2 - 10.1117/12.2312516
DO - 10.1117/12.2312516
M3 - Conference contribution
SN - 9781510619197
T3 - Proceedings of SPIE
BT - Advances in Optical Thin Films VI
PB - SPIE
ER -