Controlled texturization of PTFE using the post-discharge of a scanning RF He/O2 plasma torch

J. Hubert, T. Dufour, C.Y. Duluard, E.A.D. Carbone, N. Vandencasteele, F. Reniers

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Original language	English
Title of host publication	Proceedings of the 20th International Symposium on Plasma Chemistry (ISPC 20), 24-29 July 2011, Philadelphia, USA
Publication status	Published - 2011

Cite this

@inproceedings{cddc8b39ef09454e893a0f7ae9bf1070,

title = "Controlled texturization of PTFE using the post-discharge of a scanning RF He/O2 plasma torch",

author = "J. Hubert and T. Dufour and C.Y. Duluard and E.A.D. Carbone and N. Vandencasteele and F. Reniers",

year = "2011",

language = "English",

booktitle = "Proceedings of the 20th International Symposium on Plasma Chemistry (ISPC 20), 24-29 July 2011, Philadelphia, USA",

}

TY - GEN

T1 - Controlled texturization of PTFE using the post-discharge of a scanning RF He/O2 plasma torch

AU - Hubert, J.

AU - Dufour, T.

AU - Duluard, C.Y.

AU - Carbone, E.A.D.

AU - Vandencasteele, N.

AU - Reniers, F.

PY - 2011

Y1 - 2011

M3 - Conference contribution

BT - Proceedings of the 20th International Symposium on Plasma Chemistry (ISPC 20), 24-29 July 2011, Philadelphia, USA

ER -