Abstract
Amorphous single layered silica films deposited using industrially scalable roll-to-roll atmospheric pressure-plasma enhanced chemical vapor deposition were evaluated in terms of structure-performance relationships. Polarised attenuated total reflectance-Fourier transform infrared absorption spectroscopy and heavy water exposure to induce hydrogen-deuterium exchange revealed it was possible to control the film porosity simply by varying the precursor flux and plasma residence times. Denser silica network structures with fewer hydroxyl impurities, shorter Si-O bonds, decreased Si-O-Si bond angles and a greater magnitude of isolated pores were found in films deposited with decreased precursor flux and increased plasma residence times, and consequently exhibited significantly improved encapsulation performance.
| Original language | English |
|---|---|
| Pages (from-to) | 52274-52282 |
| Number of pages | 9 |
| Journal | RSC Advances |
| Volume | 7 |
| Issue number | 82 |
| DOIs | |
| Publication status | Published - 1 Jan 2017 |
Funding
This research received funding from the European Union's Seventh Framework Programme for research, technological development and demonstration under grant agreement number 606889; project ESR7 in the framework of the RAPID (Reactive Atmospheric Plasma processIng – eDucation network) Marie Curie Initial Training Network (http://www.rapid-itn.eu). The work is also in association with the Industrial Partnership Programme i31 (APPFF) that is carried out under an agreement between FUJIFILM Manufacturing Europe B.V. and FOM, which is part of the Netherlands Organisation for Scientic Research (NWO). The author would like to thank Rinie van Beijnen, Emile Gommers, Bruno Korngold and Yieuw-Wing Mok (FUJIFILM Manufacturing Europe B.V., Tilburg, The Netherlands) for their technical assistance.