Control of the critical dimension with a trilayer nanoimprint lithography procedure

A. Lebib, M. Natali, S.P. Li, E. Cambril, L. Manin, Y. Chen, H.M. Janssen, R.P. Sijbesma

Research output: Contribution to journal › Article › Academic › peer-review

16 Citations (Scopus)
1 Downloads (Pure)

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