Abstract
Modern steppers and scanners have a projection lens whose numerical aperture (NA) can be varied so as to optimize the image performance for certain lithographic features. Thus a variable fraction of the aberrations is actually involved in the imaging process. In this letter, we present a concise formula for the NA scaling of the Zernike coefficients. In addition, we apply our results to the Strehl ratio.
| Original language | English |
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| Pages (from-to) | 030501-1/3 |
| Number of pages | 3 |
| Journal | Journal of Microlithography, Microfabrication and Microsystems |
| Volume | 5 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 2006 |