Computer simulation with PLASIMO of a microwave plasma used for the plasma chemical vapor deposition process

Research output: Contribution to conference › Poster

Original language	English
Publication status	Published - 2008

Poster presented at the 20st Symposium Plasma Physics & Radiation Technology 2008, 4-5 March 2008, Lunteren, The Netherlands

Cite this

@conference{3ed8774b0844409baea03cae634d1f90,

title = "Computer simulation with PLASIMO of a microwave plasma used for the plasma chemical vapor deposition process",

author = "M. Jimenez-Diaz and \{Donker, van den\}, M.J. and \{Dijk, van\}, J. and \{Mullen, van der\}, J.J.A.M.",

note = "Poster presented at the 20st Symposium Plasma Physics \& Radiation Technology 2008, 4-5 March 2008, Lunteren, The Netherlands",

year = "2008",

language = "English",

}

TY - CONF

T1 - Computer simulation with PLASIMO of a microwave plasma used for the plasma chemical vapor deposition process

AU - Jimenez-Diaz, M.

AU - Donker, van den, M.J.

AU - Dijk, van, J.

AU - Mullen, van der, J.J.A.M.

N1 - Poster presented at the 20st Symposium Plasma Physics & Radiation Technology 2008, 4-5 March 2008, Lunteren, The Netherlands

PY - 2008

Y1 - 2008

M3 - Poster

ER -