Abstract
Droplet epitaxy (DE) is a growth method which can create III-V quantum dots (QDs) whose optoelectronic properties can be accurately controlled through the crystallisation conditions. In this
work, GaAs/AlGaAs DE-QDs have been analyzed with the complimentary techniques of crosssectional
scanning tunneling microscopy and atom probe tomography. Structural details and a quantitative chemical analysis of QDs of different sizes are obtained. Most QDs were found to be pure GaAs, while a small proportion exhibited high intermixing caused by a local etching process. Large QDs with a high aspect ratio were observed to have an Al-rich crown above the GaAs QD. This structure is attributed to differences in mobility of the cations during the capping phase of the DE growth.
Original language | English |
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Article number | 153102 |
Pages (from-to) | 153102-1/4 |
Number of pages | 4 |
Journal | Applied Physics Letters |
Volume | 105 |
DOIs | |
Publication status | Published - 2014 |