Comparison of soft-breakdown triggers for large-area capacitors under constant voltage stress

Jurriaan Schmitz, Hans P. Tuinhout, Hennie J. Kretschmann, Pierre H. Woerlee

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14 Citations (Scopus)

Abstract

This work quantitatively compares soft breakdown identification methods for constant: voltage stress of large-area nMOS capacitors (up to 10 mm2) with 1.8- to 12-nm gate-oxide thickness with negative gate voltage. We conclude that in the studied range, breakdown is identified more reliably with a current step trigger than through increased current fluctuation. We present a method to quantify the system background noise, and show results of data filtering algorithms that significantly enhance the ratio between the breakdown signal and background noise level. Index Terms-CMOS, reliability, soft breakdown, TDDB.

Original languageEnglish
Pages (from-to)150-157
Number of pages8
JournalIEEE Transactions on Device and Materials Reliability
Volume1
Issue number3
DOIs
Publication statusPublished - 1 Dec 2001
Externally publishedYes

Funding

Manuscript received July 13, 2001. This work was supported by the EC project HUNT. J. Schmitz is with Philips Research Leuven, B-3001 Leuven, Belgium (e-mail: [email protected]). H. P. Tuinhout, H. J. Kretschmann, and P. H. Woerlee are with the Philips Research Laboratories, 5656 AA Eindhoven, The Netherlands. Publisher Item Identifier S 1530-4388(01)10628-1.

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