Comparison of experimental and simulated extreme ultraviolet spectra of xenon and tin discharges

E.R. Kieft, K. Garloff, J.J.A.M. Mullen, van der, V.Y. Banine

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Abstract

Xenon and tin both are working elements applied in discharge plasmas that are being developed for application in extreme ultraviolet (EUV) lithography. Their spectra in the 10–21-nm-wavelength range have been analyzed. A fully analytical collisional-radiative model, including departure from equilibrium due to a net ionization rate, was used to simulate the EUV spectra. Detailed Hartree-Fock calculations, using the COWAN package, were applied for determination of the energy levels and optical transition probabilities of the 8+ to 12+ ions of both elements. For the calculation of the radiation, the opacity of the plasma was taken into account. Time-resolved measurements of the spectra from ionizing phases of two different discharge plasmas were corrected for the wavelength-dependent sensitivity of the spectrometer, and compared to the results of the simulations. Fairly good agreement between the experiments and the model calculations has been found.
Original languageEnglish
Article number036402
Pages (from-to)036402-1/12
Number of pages12
JournalPhysical Review E - Statistical, Nonlinear, and Soft Matter Physics
Volume71
Issue number3
DOIs
Publication statusPublished - 2005

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