Comparative study of Cl2, Cl2/O2, and Cl2/N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

C.F.V. Carlström, R. Heijden, van der, M.S.P. Andriesse, F. Karouta, R.W. Heijden, van der, E.W.J.M. Drift, van der, H.W.M. Salemink

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