Compact widely-tunable laser on an InP membrane on silicon

Naoki Takahashi; Yi Wang; Nobuhiko Nishiyama; Kevin A. Williams; Sylwester Latkowski; Yuqing Jiao

doi:10.1109/OECC56963.2023.10209854

Compact widely-tunable laser on an InP membrane on silicon

Naoki Takahashi
, Yi Wang
, Nobuhiko Nishiyama
, Kevin A. Williams
, Sylwester Latkowski
, Yuqing Jiao

Photonic Integration

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

8 Citations (Scopus)

11 Downloads (Pure)

Abstract

Compact broadband tunable laser source with a footprint of 0.82 mm 2 and a 50-nm wide tuning range is experimentally demonstrated on the InP membrane on silicon (IMOS) platform. This high-density integration technology allowed the reduction of the laser footprint by a factor of four, when compared to its equivalent realized in traditional InP technology.

Original language	English
Title of host publication	2023 Opto-Electronics and Communications Conference, OECC 2023
Publisher	Institute of Electrical and Electronics Engineers
Pages	1-2
Number of pages	2
ISBN (Electronic)	978-1-6654-6213-6
DOIs	https://doi.org/10.1109/OECC56963.2023.10209854
Publication status	Published - 14 Aug 2023
Event	28th Opto-Electronics and Communications Conference (OECC 2023) - Shanghai, China Duration: 2 Jul 2023 → 6 Jul 2023 Conference number: 28 https://ieeexplore.ieee.org/xpl/conhome/10209604/proceeding

Conference

Conference	28th Opto-Electronics and Communications Conference (OECC 2023)
Abbreviated title	OECC 2023
Country/Territory	China
City	Shanghai
Period	2/07/23 → 6/07/23
Internet address	https://ieeexplore.ieee.org/xpl/conhome/10209604/proceeding

Keywords

InP membrane
Photonic integrated circuit
semiconductor tunable laser

Access to Document

10.1109/OECC56963.2023.10209854

Cite this

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title = "Compact widely-tunable laser on an InP membrane on silicon",

abstract = "Compact broadband tunable laser source with a footprint of 0.82 mm 2 and a 50-nm wide tuning range is experimentally demonstrated on the InP membrane on silicon (IMOS) platform. This high-density integration technology allowed the reduction of the laser footprint by a factor of four, when compared to its equivalent realized in traditional InP technology.",

keywords = "InP membrane, Photonic integrated circuit, semiconductor tunable laser",

author = "Naoki Takahashi and Yi Wang and Nobuhiko Nishiyama and Williams, \{Kevin A.\} and Sylwester Latkowski and Yuqing Jiao",

year = "2023",

month = aug,

day = "14",

doi = "10.1109/OECC56963.2023.10209854",

language = "English",

pages = "1--2",

booktitle = "2023 Opto-Electronics and Communications Conference, OECC 2023",

publisher = "Institute of Electrical and Electronics Engineers",

address = "United States",

note = "28th Opto-Electronics and Communications Conference (OECC 2023), OECC 2023 ; Conference date: 02-07-2023 Through 06-07-2023",

url = "https://ieeexplore.ieee.org/xpl/conhome/10209604/proceeding",

}

Takahashi, N, Wang, Y, Nishiyama, N, Williams, KA , Latkowski, S & Jiao, Y 2023, Compact widely-tunable laser on an InP membrane on silicon. in 2023 Opto-Electronics and Communications Conference, OECC 2023., 10209854, Institute of Electrical and Electronics Engineers, pp. 1-2, 28th Opto-Electronics and Communications Conference (OECC 2023), Shanghai, China, 2/07/23. https://doi.org/10.1109/OECC56963.2023.10209854

Compact widely-tunable laser on an InP membrane on silicon. / Takahashi, Naoki; Wang, Yi; Nishiyama, Nobuhiko et al.
2023 Opto-Electronics and Communications Conference, OECC 2023. Institute of Electrical and Electronics Engineers, 2023. p. 1-2 10209854.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Compact widely-tunable laser on an InP membrane on silicon

AU - Takahashi, Naoki

AU - Wang, Yi

AU - Nishiyama, Nobuhiko

AU - Williams, Kevin A.

AU - Latkowski, Sylwester

AU - Jiao, Yuqing

N1 - Conference code: 28

PY - 2023/8/14

Y1 - 2023/8/14

N2 - Compact broadband tunable laser source with a footprint of 0.82 mm 2 and a 50-nm wide tuning range is experimentally demonstrated on the InP membrane on silicon (IMOS) platform. This high-density integration technology allowed the reduction of the laser footprint by a factor of four, when compared to its equivalent realized in traditional InP technology.

AB - Compact broadband tunable laser source with a footprint of 0.82 mm 2 and a 50-nm wide tuning range is experimentally demonstrated on the InP membrane on silicon (IMOS) platform. This high-density integration technology allowed the reduction of the laser footprint by a factor of four, when compared to its equivalent realized in traditional InP technology.

KW - InP membrane

KW - Photonic integrated circuit

KW - semiconductor tunable laser

UR - https://www.scopus.com/pages/publications/85169415808

U2 - 10.1109/OECC56963.2023.10209854

DO - 10.1109/OECC56963.2023.10209854

M3 - Conference contribution

SP - 1

EP - 2

BT - 2023 Opto-Electronics and Communications Conference, OECC 2023

PB - Institute of Electrical and Electronics Engineers

T2 - 28th Opto-Electronics and Communications Conference (OECC 2023)

Y2 - 2 July 2023 through 6 July 2023

ER -

Compact widely-tunable laser on an InP membrane on silicon

Abstract

Conference

Keywords

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