Common Precursors and Surface Mechanisms for Atomic Layer Deposition

Seán Thomas Barry, Peter George Gordon, Vincent Vandalon

Research output: Chapter in Book/Report/Conference proceedingEntry for encyclopedia/dictionaryAcademicpeer-review

5 Citations (Scopus)
1 Downloads (Pure)

Abstract

Organometallic compounds from across the periodic table have been investigated and employed as precursors for atomic layer deposition. Simple alkyls were employed first in 1985 and represent the most well-studied class of precursors in ALD. Progress in precursor development now spans hundreds of different ligands on most of the naturally occurring elements on the periodic table.

This chapter highlights four fundamental ligand families—alkyls, amides, alkoxides, and carbonyls—and their surface chemistry in ALD processes. These classes highlight homoleptic and heteroleptic compounds, as well as haptic ligands (Cp, in the case of alkyls) and chelating ligands (beta-diketonates in the case of alkoxides, amidinates in the case of amides), showing a wide variety of surface chemistry. Each ligand family is highlighted by the initial ALD processes for a variety of metal centers, and then further discusses important and unusual surface chemistry related to each of these families.
Original languageEnglish
Title of host publicationComprehensive Organometallic Chemistry IV
Subtitle of host publicationVolume 14 Applications III. Materials Science, Nanoscience, Polymer Science and Surface Chemistry
PublisherElsevier
Chapter14
Pages534-552
Number of pages19
ISBN (Electronic)9780323913508
ISBN (Print)978-0-323-91350-8
DOIs
Publication statusPublished - 2022

Keywords

  • ALD
  • Alkoxide
  • Alkyl
  • Amide
  • Amidinate
  • Atomic layer deposition
  • Beta-diketonate
  • Carbonyl
  • Cyclopentadienyl
  • Precursors
  • Surface chemistry

Fingerprint

Dive into the research topics of 'Common Precursors and Surface Mechanisms for Atomic Layer Deposition'. Together they form a unique fingerprint.

Cite this