Collective Thomson scattering experiments on a tin vapor discharge in the prepinch phase

E.R. Kieft; J.J.A.M. Mullen, van der; G.M.W. Kroesen; V.Y. Banine; K.N. Koshelev

doi:10.1103/PhysRevE.70.056413

Collective Thomson scattering experiments on a tin vapor discharge in the prepinch phase

E.R. Kieft
, J.J.A.M. Mullen, van der
, G.M.W. Kroesen
, V.Y. Banine
, K.N. Koshelev

Research output: Contribution to journal › Article › Academic › peer-review

25 Citations (Scopus)

242 Downloads (Pure)

Abstract

Partially collective Thomson scattering measurements have been performed on a triggered vacuum arc in tin vapor, which is a candidate source of extreme ultraviolet light for application in semiconductor lithography. In this paper, results on the electron densities and temperatures are presented for the prepinch phase of the discharge. Electron densities and temperatures increase from 1*10/sup 23/ m/sup -3/ to 1*10/sup 24/ m/sup -3/ and from 5 eV to over 30 eV, respectively, in about 100 ns. The results are confirmed by Stark broadening data

Original language	English
Article number	056413
Pages (from-to)	056413-1/7
Number of pages	7
Journal	Physical Review E - Statistical, Nonlinear, and Soft Matter Physics
Volume	70
Issue number	5
DOIs	https://doi.org/10.1103/PhysRevE.70.056413
Publication status	Published - 2004

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abstract = "Partially collective Thomson scattering measurements have been performed on a triggered vacuum arc in tin vapor, which is a candidate source of extreme ultraviolet light for application in semiconductor lithography. In this paper, results on the electron densities and temperatures are presented for the prepinch phase of the discharge. Electron densities and temperatures increase from 1*10/sup 23/ m/sup -3/ to 1*10/sup 24/ m/sup -3/ and from 5 eV to over 30 eV, respectively, in about 100 ns. The results are confirmed by Stark broadening data",

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AU - Banine, V.Y.

AU - Koshelev, K.N.

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AB - Partially collective Thomson scattering measurements have been performed on a triggered vacuum arc in tin vapor, which is a candidate source of extreme ultraviolet light for application in semiconductor lithography. In this paper, results on the electron densities and temperatures are presented for the prepinch phase of the discharge. Electron densities and temperatures increase from 1*10/sup 23/ m/sup -3/ to 1*10/sup 24/ m/sup -3/ and from 5 eV to over 30 eV, respectively, in about 100 ns. The results are confirmed by Stark broadening data

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Collective Thomson scattering experiments on a tin vapor discharge in the prepinch phase

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