The present invention describes a method for manufg. a low dielec. const. coating, which coating comprises an inorg. and an org. component, wherein precursors for these components are activated in at least two plasma sources for plasma activated deposition of a chem. vapor phase and wherein said activated precursors are combined before they are deposited from the chem. vapor phase on the substrate to form the coating, characterized in that said inorg. component comprises porous nanoparticles. The invention also describes a device for the manuf. of a low dielec. const. coating.
|Publication status||Published - 19 Oct 2005|