Coating of particles by plasma enhanced chemical vapour deposition

G.V. Paeva, W.W. Stoffels, E. Stoffels - Adamowicz, R P Dahiya, G.M.W. Kroesen

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

The interest in dusty plasma research, which is a relatively new field in plasma physics, has increased with the development of microelectronics. The dust particles appear as pollutant in this industrial processing. Recently, however, they are seen from a different point of view – they can be useful in various technologies: chemical catalysis, solar cell fabrication, ceramics etc.[1,2,3] In this investigation we have concentrated on coating of dust particles. This process allows us to obtain composite particles with combined properties of the base powder material with those of the deposited layer. The process of particle coating has applications in different fields: the toner production, the chemical catalysis, fluorescence etc.
Original languageEnglish
Title of host publicationFrontiers in low temperature plasma diagnostics IV : papers, Rolduc Conference Centre, The Netherlands, 25.03.2001-29.03.2001
Place of PublicationEindhoven
PublisherEindhoven University of Technology
Pages238-240
Publication statusPublished - 2001

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