Coating of particles by plasma enhanced chemical vapour deposition

G.V. Paeva; W.W. Stoffels; E. Stoffels -  Adamowicz; R P Dahiya; G.M.W. Kroesen

Coating of particles by plasma enhanced chemical vapour deposition

G.V. Paeva, W.W. Stoffels, E. Stoffels - Adamowicz, R P Dahiya, G.M.W. Kroesen

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

The interest in dusty plasma research, which is a relatively new field in plasma physics, has increased with the development of microelectronics. The dust particles appear as pollutant in this industrial processing. Recently, however, they are seen from a different point of view – they can be useful in various technologies: chemical catalysis, solar cell fabrication, ceramics etc.[1,2,3] In this investigation we have concentrated on coating of dust particles. This process allows us to obtain composite particles with combined properties of the base powder material with those of the deposited layer. The process of particle coating has applications in different fields: the toner production, the chemical catalysis, fluorescence etc.

Original language	English
Title of host publication	Frontiers in low temperature plasma diagnostics IV : papers, Rolduc Conference Centre, The Netherlands, 25.03.2001-29.03.2001
Place of Publication	Eindhoven
Publisher	Eindhoven University of Technology
Pages	238-240
Publication status	Published - 2001

Cite this

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title = "Coating of particles by plasma enhanced chemical vapour deposition",

abstract = "The interest in dusty plasma research, which is a relatively new field in plasma physics, has increased with the development of microelectronics. The dust particles appear as pollutant in this industrial processing. Recently, however, they are seen from a different point of view – they can be useful in various technologies: chemical catalysis, solar cell fabrication, ceramics etc.[1,2,3] In this investigation we have concentrated on coating of dust particles. This process allows us to obtain composite particles with combined properties of the base powder material with those of the deposited layer. The process of particle coating has applications in different fields: the toner production, the chemical catalysis, fluorescence etc.",

author = "G.V. Paeva and W.W. Stoffels and {Stoffels - Adamowicz}, E. and Dahiya, {R P} and G.M.W. Kroesen",

year = "2001",

language = "English",

pages = "238--240",

booktitle = "Frontiers in low temperature plasma diagnostics IV : papers, Rolduc Conference Centre, The Netherlands, 25.03.2001-29.03.2001",

publisher = "Eindhoven University of Technology",

}

Coating of particles by plasma enhanced chemical vapour deposition. / Paeva, G.V.; Stoffels, W.W.; Stoffels - Adamowicz, E. et al.

Frontiers in low temperature plasma diagnostics IV : papers, Rolduc Conference Centre, The Netherlands, 25.03.2001-29.03.2001. Eindhoven : Eindhoven University of Technology, 2001. p. 238-240.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Coating of particles by plasma enhanced chemical vapour deposition

AU - Paeva, G.V.

AU - Stoffels, W.W.

AU - Stoffels - Adamowicz, E.

AU - Dahiya, R P

AU - Kroesen, G.M.W.

PY - 2001

Y1 - 2001

N2 - The interest in dusty plasma research, which is a relatively new field in plasma physics, has increased with the development of microelectronics. The dust particles appear as pollutant in this industrial processing. Recently, however, they are seen from a different point of view – they can be useful in various technologies: chemical catalysis, solar cell fabrication, ceramics etc.[1,2,3] In this investigation we have concentrated on coating of dust particles. This process allows us to obtain composite particles with combined properties of the base powder material with those of the deposited layer. The process of particle coating has applications in different fields: the toner production, the chemical catalysis, fluorescence etc.

AB - The interest in dusty plasma research, which is a relatively new field in plasma physics, has increased with the development of microelectronics. The dust particles appear as pollutant in this industrial processing. Recently, however, they are seen from a different point of view – they can be useful in various technologies: chemical catalysis, solar cell fabrication, ceramics etc.[1,2,3] In this investigation we have concentrated on coating of dust particles. This process allows us to obtain composite particles with combined properties of the base powder material with those of the deposited layer. The process of particle coating has applications in different fields: the toner production, the chemical catalysis, fluorescence etc.

M3 - Conference contribution

SP - 238

EP - 240

BT - Frontiers in low temperature plasma diagnostics IV : papers, Rolduc Conference Centre, The Netherlands, 25.03.2001-29.03.2001

PB - Eindhoven University of Technology

CY - Eindhoven

ER -

Coating of particles by plasma enhanced chemical vapour deposition

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